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US 10,372,044 B2Granted
Substrate table, a lithographic apparatus and a device manufacturing method
AssigneeASML Netherlands B.V.
InventorsNicolaas Ten Kate, Raymond Wilhelmus Louis Lafarre
Life of this patent
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Abstract
A table for a lithographic apparatus, the table having a catchment opening formed in an upper surface of the table, the catchment opening in fluid communication through the table with the environment of the table at a drain opening in a surface of the table other than the upper surface.
Claims20
A table for a lithographic apparatus, the table comprising:
- a support region having a protrusion to support to an object;
- a catchment opening arranged to receive liquid that passes through a gap between the object, when supported on the support region, and an outer structure of the table;
- a drain opening configured to receive liquid that passes through the catchment opening;
- a protruding structure protruding from a surface of the table, the protruding structure configured to substantially prevent liquid in the passage from entering a space between the object and/or outer structure, when supported on the table, and a part of the table, wherein the protruding structure defines at least in part the catchment opening;
- a passage that extends from the catchment opening to below the surface and terminates at the drain opening, the passage having a uniform width from the catchment opening to the termination at the drain opening;
- and
- a porous structure in the passage to receive liquid that passes through the gap.
4 more elements
A table for a lithographic apparatus, the table comprising:
- a support region having a protrusion to support to an object;
- a catchment opening arranged to receive liquid that passes through a gap between the object, when supported on the support region, and a plate removably mounted on an upper surface of the table;
- a drain opening configured to receive liquid that passes through the catchment opening;
- a protruding structure protruding from a surface of the table, the protruding structure configured to substantially prevent liquid in the passage from entering a space between the object and/or plate, when supported on the table, and a part of the table, wherein the protruding structure defines at least in part the catchment opening;
- a passage that extends from the catchment opening to below the surface and terminates at the drain opening, the passage having a uniform width from the catchment opening to the termination at the drain opening;
- and
- a porous structure to receive liquid that passes through the gap, the porous structure having an upper surface lower than a bottom surface of the object, when supported on the support region.
4 more elements
A table for a lithographic apparatus, the table comprising:
- a catchment opening defined in a surface of the table, the catchment opening arranged to receive liquid that passes through a gap between the object, when supported on the table, and an outer structure of the table;
- a protruding structure configured to substantially prevent liquid from the catchment opening from entering a space between the object and/or outer structure, when supported on the table, and a part of the table;
- a porous structure to receive liquid that passes through the gap, the porous structure configured to stop liquid flow and accumulate liquid above the porous structure;
- and
- a drain opening configured to receive liquid that passes through the catchment opening.
2 more elements
Dependencies are inferred from the claim text.