Imprint apparatus, and method of manufacturing article

An imprint apparatus which performs an imprint process of forming a pattern of an imprint material on a substrate by using a mold, the apparatus comprising:

• a plurality of imprinting devices including a first imprinting device and a second imprinting device, each of which is configured to perform the imprint process;
• and
• a controller configured to control the plurality of imprinting devices, wherein the controller is configured to:
• cause the first imprinting device to perform the imprint process for a first area on a first substrate, and cause the second processing device to perform the imprint process for a second area different from the first area on the first substrate,
• cause the first imprinting device to perform the imprint process for an area on a second substrate which has the same substrate position as the first area on the first substrate, and cause the second imprinting device to perform the imprint process for an area on the second substrate which has the same substrate position as the second area on the first substrate, and
• wherein the controller is configured to control the plurality of imprinting devices to perform the imprint processes on the first and second substrates in parallel by setting the first area and the second area, thereby to control the time period required to perform the imprint processes by each of the first imprinting device and the second imprinting device.

An imprint apparatus which performs imprint processes to a plurality of shot regions in each of a plurality of substrate, the plurality of shot regions having the same shapes with each other, the apparatus comprising:

• a plurality of imprinting devices including a first imprinting device and a second imprinting device, each of which is configured to perform the imprint processes;
• and
• a controller configured to:
• set a first area and a second area for each substrate, the first area and the second area having different positions in a substrate from each other, and
• control the plurality of imprintng devices, so as to cause the first imprinting device to perform the imprint processes for shot regions included in the first area of each substrate, and cause the second imprinting device to perform the imprint processes for shot regions included in the second area of each substrate,
• wherein the imprint processes by the first imprinting device for the first area of a first substrate and the imprint processes by the second imprinting device for the second area of a second substrate are performed in parallel, and
• wherein the controller is configured to set the first area and the second area, so that a difference between a time period required to perform the imprint processes by the first imprinting device for shot regions included in the first area of the first substrate and a time period required to perform the imprint processes by the second imprinting device for shot regions included in the second area of the second substrate is reduced.

An imprint apparatus which performs imprint processes to a plurality of shot regions in each of a plurality of substrate, the plurality of shot regions having the same shapes with each other, the apparatus comprising:

• a plurality of imprinting devices including a first imprinting device and a second imprinting device, each of which is configured to perform the imprint processes;
• and
• a controller configured to control the plurality of imprinting devices, wherein the controller is configured to:
• assign shot regions located in a first area on each substrate among the plurality of shot regions, as first shot regions for performing the imprint processes by the first imprinting device, and assign shot regions located in a second area different from the first area on each substrate among the plurality of shot regions, as second shot regions for performing the imprint processes by the second imprinting device, and
• control the plurality of imprinting devices, so that the imprint processes of the first shot regions are performed by the first imprinting device and the imprint processes of the second shot regions are performed by the second imprinting device,
• wherein the controller is configured to control the plurality of imprinting devices to perform the imprint processes for the plurality of substrates in parallel by assigning the first shot regions and the second shot regions thereby to control the time period required to perform the imprint processes by each of the first imprinting device and the second imprinting device, by assigning the first shot regions and the second shot regions to either
• (i) vary the number of the first shot regions and the number of the second shot regions, or
• (ii) vary a moving amount of a substrate for performing the imprint processes of the first shot regions and a moving amount of the substrate for performing the imprint processes of the second shot regions.