Substrate processing apparatus

A substrate processing apparatus comprising:

• a processing unit including a processing liquid nozzle that supplies a processing liquid to a substrate;
• a supply tank that supplies the processing liquid to the processing liquid nozzle;
• a first replenishment tank and a second replenishment tank for replenishing the supply tank with the processing liquid;
• a processing liquid collector connected to the processing unit to collect the processing liquid used in the processing unit and selectively supply the used processing liquid to the first and second replenishment tanks;
• a processing liquid replenisher connected to the supply tank to selectively replenish the supply tank with the processing liquid from the first and second replenishment tanks;
• a processing liquid circulator connected to the first and second replenishment tanks to selectively circulate the processing liquid in the first replenishment tank and the processing liquid in the second replenishment tank;
• a heater that heats the processing liquid passing through the processing liquid circulator;
• and
• a controller configured to control the processing liquid replenisher to replenish the supply tank with the processing liquid in the second replenishment tank, and control the processing liquid circulator to circulate the processing liquid in the first replenishment tank while being heated by the heater, in a period in which the used processing liquid collected by the processing liquid collector is supplied to the first replenishment tank, and control the processing liquid replenisher to replenish the supply tank with the processing liquid in the first replenishment tank, and control the processing liquid circulator to circulate the processing liquid in the second replenishment tank while being heated by the heater, in a period in which the used processing liquid collected by the processing liquid collector is supplied to the second replenishment tank.