Substrate support, method of compensating unflatness of an upper surface of a substrate, lithographic apparatus and device manufacturing method
AssigneeASML Netherlands B.V.
InventorThomas Poiesz
Life of this patent
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Abstract
The present invention relates to a substrate support (1), comprising: a support body (2) forming a support surface configured to support a substrate, wherein said support surface comprises a support surface part configured to support a substrate area of the substrate, at least one actuator (6) arranged on the support body at a location aligned with the support surface part and configured to contract or extend in a direction substantially parallel to a main plane of the support surface.
Claims13
A substrate support, comprising:
- a support body forming a support surface configured to support a substrate, wherein the support surface comprises a support surface part configured to support a substrate area of the substrate, wherein the substrate area is a substrate edge area of the substrate and wherein the support surface part is a support surface edge part configured to support the substrate edge area of the substrate;
- and
- a plurality of actuators arranged on the support body at locations aligned with the support surface part and configured to contract or extend in a direction substantially parallel to a main plane of the support surface,
- wherein the support surface edge part has a reduced thickness with respect to a center part of the support body, the edge part forming the support surface edge part, wherein at least a subset of the plurality of actuators are arranged on the edge part, and
- wherein, upon actuation, at least one actuator is configured to bend a portion of the support surface edge part to compensate an unflatness of an upper surface of an area of the substrate loaded on the support surface.
A method of compensating an unflatness of an upper surface of a substrate area of a substrate loaded on a support surface of a support body of a substrate support, wherein the substrate support comprises at least one actuator mounted on a substrate edge area of the support body and configured to contract or extend in a direction substantially parallel to a main surface of the substrate loaded on the substrate support, wherein the support surface edge part has a reduced thickness with respect to a center part of the support body, the edge part forming the support surface edge part, wherein at least a subset of the plurality of actuators are arranged on the edge part, and wherein the method comprises:
- actuating at least one actuator to extend and/or contract to bend a portion of the support surface edge part on the basis of data representative of unflatness of the upper surface of the substrate area of the substrate loaded on the substrate support to create a curve in the support body, wherein the curve of the support body substantially compensates the unflatness of the upper surface of the substrate area.
A lithographic apparatus configured to transfer a pattern from a patterning device onto a substrate, comprising:
- a substrate support, the substrate support comprising:
- a support body forming a support surface configured to support a substrate, wherein the support surface comprises a support surface part configured to support a substrate area of the substrate, wherein the substrate area is a substrate edge area of the substrate and wherein the support surface part is a support surface edge part configured to support the substrate edge area of the substrate;
- and
- a plurality of actuators arranged on the support body at locations aligned with the support surface part and configured to contract or extend in a direction substantially parallel to a main plane of the support surface,
- wherein the support surface edge part has a reduced thickness with respect to a center part of the support body, the edge part forming the support surface edge part, wherein at least a subset of the plurality of actuators are arranged on the edge part, and
- wherein, upon actuation, at least one actuator is configured and arranged to bend a portion of the support surface edge part to compensate an unflatness of an upper surface of an area of the substrate loaded on the support surface.
A device manufacturing method comprising transferring a pattern from a patterning device onto a substrate, wherein the method comprises:
- loading the substrate on a support surface of a support body of a substrate support, wherein the substrate support comprises at least one actuator mounted on a substrate edge area of the support body and configured to contract or extend in a direction substantially parallel to a main surface of the substrate loaded on the substrate support, wherein the support surface edge part has a reduced thickness with respect to a center part of the support body, the edge part forming the support surface edge part, wherein at least a subset of the plurality of actuators are arranged on the edge part,
- wherein the loading comprises actuating the at least one actuator to extend and/or contract to bend a portion of the support surface edge part on the basis of data representative for unflatness of the upper surface of the substrate area of the substrate loaded on the substrate support, in order to create a curve in the support body, wherein the curve of the support body substantially compensates the unflatness of the upper surface of the substrate area.
Dependencies are inferred from the claim text.