Carbon thin-film device and method of manufacturing the same

A method of manufacturing a carbon thin-film device, the method comprising:

• forming a functional group on a surface of a substrate which does not have a metal layer on the surface to functionalize the surface of the substrate, the functional group comprising a hydroxyl group;
• pre-supplying carbon tetrabromide (CBr4) to the substrate, on which the hydroxyl group is formed;
• and
• depositing a carbon thin film through atomic layer deposition on the substrate, after the carbon tetrabromide is pre-supplied to the substrate,
• wherein the functionalizing of the substrate includes forming an adsorption layer, which includes the functional group, on the substrate, the adsorption layer being formed of a single atomic layer or a single molecular layer,
• wherein atoms of the adsorption layer are covalent-bonded with atoms of the substrate, and carbon atoms of a basal layer of the carbon thin film are covalent-bonded with the atoms of the adsorption layer,
• wherein the depositing of the carbon thin film on the substrate includes repeating unit cycles a number of times,
• wherein the unit cycle includes
• supplying halocarbon as carbon precursors to the substrate after the carbon tetrabromide is pre-supplied on the substrate;
• supplying a purge gas to the substrate to purge the substrate;
• supplying a reaction gas to the substrate;
• and
• supplying the purge gas to the substrate to purge the substrate.