Substrate holding apparatus
AssigneeEbara Corporation
InventorsNaoki Toyomura, Mitsuru Miyazaki, Takuya Inoue
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AssigneeEbara Corporation
InventorsNaoki Toyomura, Mitsuru Miyazaki, Takuya Inoue
Estimating the term…
There is disclosed an improved substrate holding apparatus which can minimize deformation of a spring, which is provided to bias a support post for supporting a substrate, even when a large centrifugal force acts on the spring. The substrate holding apparatus includes: a support post movable in an axial direction thereof; a chuck provided on the support post and configured to hold a periphery of a substrate; a spring biasing the support post in the axial direction; a first structure configured to restrict a movement of an upper portion of the spring in a direction perpendicular to the axial direction of the support post; and a second structure configured to restrict a movement of a lower portion of the spring in a direction perpendicular to the axial direction of the support post.
A substrate rotating apparatus comprising:
A substrate rotating apparatus comprising:
A substrate rotating apparatus comprising:
A substrate rotating apparatus comprising:
Dependencies are inferred from the claim text.