Imprint apparatus, imprint method, and method of manufacturing article

An imprint apparatus which forms a pattern of an imprint material on a shot region of a substrate by using a mold including a first portion and a second portion that are adjacent to each other and have different pattern configurations from each other, comprising:

• a supplier configured to supply the imprint material onto the shot region;
• and
• a processor configured to determine information on an arrangement pattern of the imprint material to be supplied as droplets on the shot region by the supplier, and control the supplier based on the information,
• wherein the processor is configured to:
• obtain a pattern configuration of the first portion of the mold and a pattern configuration of the second portion of the mold;
• obtain a first arrangement pattern of the imprint material generated based on the pattern configuration of the first portion of the mold, and a second arrangement pattern of the imprint material generated based on the pattern configuration of the second portion of the mold,
• specify a boundary portion of the mold where a thickness of the pattern of the imprint material to be formed by the mold cannot be within an allowable range in a case of respectively adopting the first arrangement pattern to the first portion of the mold and the second arrangement pattern to the second portion of the mold, the boundary portion of the mold including a part of the first portion of the mold and a part of the second portion of the mold,
• generate a third arrangement pattern of the imprint material to be
• adopted to the boundary portion of the mold, such that the thickness of the pattern of the imprint material to be formed by the boundary portion of the mold falls within the allowable range, by combining the first arrangement pattern and the second arrangement pattern, and
• determine the information on the arrangement pattern of the imprint material to be supplied as droplets on the shot region by the supplier based on the first arrangement pattern, the second arrangement pattern, and the third arrangement pattern, wherein the pattern configuration of the first portion of the mold includes concave portions extending in a predetermined direction, and the pattern configuration of the second portion of the mold includes no three-dimensional pattern.