patentgrep
SearchCompaniesTechnologiesAPIPricingDocs
DocsGet an API key
  1. Technology classes
  2. /Y · General tagging of new technological developments
  3. /Y10 · Technical subjects covered by former uspc
  4. /Y10S · Technical subjects covered by former uspc cross-reference art collections [xracs] and digests
  5. /Y10S 204/00 · Chemistry: electrical and wave energy
  6. /Y10S 204/12
Y10S 204/12

Electrochemical machining

Y10S204/12 (Electrochemical machining) appears on 5 US grants and 1 published applications in this corpus.

Search patents in Y10S

Where it sits

  1. YGeneral tagging of new technological developments
  2. Y10Technical subjects covered by former uspc
  3. Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests
  4. Y10S 204/00Chemistry: electrical and wave energy
  5. Y10S 204/12Electrochemical machining
Granted patents
5
Published applications
1
Assignees
4
Inventors
12
Latest grant
27 Apr 2004

Filings by year

Granted patentsPublished applications
Y10S 204/12: granted patents and published applications per publication year
YearGranted patentsPublished applications
197910
198000
198100
198200
198300
198400
198510
198600
198700
198800
198900
199000
199100
199200
199300
199400
199500
199600
199700
199800
199900
200000
200111
200200
200310
200410

1979198919992004

By publication year. Applications have been published since 2001.

Recent patents

  • Electrochemical etching cell27 Apr 2004US 6,726,815 B1Robert Bosch GmbH
  • Part fabricating apparatus8 Jul 2003US 6,589,402 B2Seiko Instruments Inc.
  • Part fabricating method and part fabricating apparatus24 Apr 2001US 6,221,228 B1Seiko Instruments Inc.
  • Abrasive polishing method23 Apr 1985US 4,512,859 AInoue-Japax Research Incorporated
  • Method for the initiation of chemical reactions by low pressure optical pumping6 Mar 1979US 4,142,955 ACalspan Corporation
  • Part fabricating method and part fabricating apparatus31 May 2001US 2001/0002001 A1Seiko Instruments Inc.

Most cited

By later US patents
  • Abrasive polishing method23US 4,512,859 AInoue-Japax Research Incorporated · 1985
  • Electrochemical etching cell10US 6,726,815 B1Robert Bosch GmbH · 2004
  • Method for the initiation of chemical reactions by low pressure optical pumping2US 4,142,955 ACalspan Corporation · 1979
  • Part fabricating apparatus2US 6,589,402 B2Seiko Instruments Inc. · 2003
  • Part fabricating method and part fabricating apparatus1US 6,221,228 B1Seiko Instruments Inc. · 2001

Top assignees

Documents
  • Seiko Instruments Inc.3
  • CCalspan Corporation1
  • IJInoue-Japax Research Incorporated1
  • Robert Bosch GmbH1

Often classified with

  • B23HWorking of metal by the action of a high concentration of electric3
  • C25DProcesses for the electrolytic or electrophoretic production of coatings3
  • B01DSeparation1
  • B01JChemical or physical processes1
  • B24BMachines, devices, or processes for grinding or polishing1
  • C01CAmmonia1
  • C01PIndexing scheme relating to structural and physical aspects of solid inorganic compounds1
  • C25FProcesses for the electrolytic removal of materials from objects1

Documents that also carry the other class.

patentgrep

Search every US patent grant since 1976 and every published application since 2001. Updated weekly from USPTO.

Product

  • Search
  • New this week
  • Where the data comes from
  • Pricing

Browse

  • Companies
  • Technology classes

Developers

  • API docs
  • PatentsView-compatible API
  • MCP server
  • Changelog

About

  • Privacy
  • Terms
© 2026 patentgrepData from USPTO bulk files