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  1. Technology classes
  2. /G · Physics
  3. /G11 · Information storage
  4. /G11B · Information storage based on relative movement between record carrier and transducer
  5. /G11B 7/00 · Recording or reproducing by optical means
  6. /G11B 7/24 · Record carriers characterised by shape, structure or physical properties, or by the
  7. /G11B 7/241 · Characterised by the selection of the material
  8. /G11B 7/252 · Of layers other than recording layers
  9. /G11B 7/254 · Of protective topcoat layers
  10. /G11B 2007/25402
G11B 2007/25402

Consisting essentially of organic resins

Official title: {consisting essentially of organic resins}

G11B2007/25402 (Consisting essentially of organic resins) appears on 2 US grants and 2 published applications in this corpus.

Search patents in G11B

Where it sits

  1. GPhysics
  2. G11Information storage
  3. G11BInformation storage based on relative movement between record carrier and transducer
  4. G11B 7/00Recording or reproducing by optical means
  5. G11B 7/24Record carriers characterised by shape, structure or physical properties, or by the
  6. G11B 7/241Characterised by the selection of the material
  7. G11B 7/252Of layers other than recording layers
  8. G11B 7/254Of protective topcoat layers
  9. G11B 2007/25402Consisting essentially of organic resins
  10. 1subgroup, listed below
Granted patents
2
Published applications
2
Assignees
1
Inventors
7
Latest grant
2 May 2023

Filings by year

Granted patentsPublished applications
G11B 2007/25402: granted patents and published applications per publication year
YearGranted patentsPublished applications
202001
202101
202210
202310

2020202120222023

By publication year.

Subgroups

Granted patents
  • G11B 2007/25405Comprising inorganic fillerIndexing code0

Recent patents

  • System consisting of two UV-curing dry-transfer coating layers for the protection of a hologram in a photopolymer film composite2 May 2023US 11,640,136 B2Covestro Deutschland AG
  • Film structure containing a photopolymer layer for holographic exposure and a coating layer of high resistance8 Mar 2022US 11,267,943 B2Covestro Deutschland AG
  • Film structure containing a photopolymer layer for holographic exposure and a coating layer of high resistance23 Sep 2021US 2021/0292505 A1Covestro Deutschland AG
  • System consisting of two uv-curing dry-transfer coating layers for the protection of a hologram in a photopolymer film composite28 May 2020US 2020/0166889 A1Covestro Deutschland AG

Most cited

By later US patents

No patent in this class has been cited by a later US patent yet.

Top assignees

Documents
  • CDCovestro Deutschland AG4

Often classified with

  • C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds4
  • G03HHolographic processes or apparatus4
  • B32BLayered products, i.e. products built-up of strata of flat or non-flat2
  • C08JWorking-up2
  • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients2
  • C08LCompositions of macromolecular compounds2

Documents that also carry the other class.

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