G05B 19/404
Characterised by control arrangements for compensation
Official title: characterised by control arrangements for compensation, e.g. for backlash, overshoot, tool offset, tool wear, temperature, machine construction errors, load, inertia (G05B19/19, G05B19/41 take precedence)
G05B19/404 (Characterised by control arrangements for compensation) appears on 1,127 US grants and 1,177 published applications in this corpus.
Search patents in G05B- Granted patents
- 1,127
- Published applications
- 1,177
- Assignees
- 494
- Inventors
- 2,474
- Latest grant
- 8 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 1 | 0 |
| 1977 | 1 | 0 |
| 1978 | 2 | 0 |
| 1979 | 1 | 0 |
| 1980 | 1 | 0 |
| 1981 | 1 | 0 |
| 1982 | 1 | 0 |
| 1983 | 1 | 0 |
| 1984 | 0 | 0 |
| 1985 | 3 | 0 |
| 1986 | 5 | 0 |
| 1987 | 7 | 0 |
| 1988 | 7 | 0 |
| 1989 | 4 | 0 |
| 1990 | 10 | 0 |
| 1991 | 9 | 0 |
| 1992 | 11 | 0 |
| 1993 | 8 | 0 |
| 1994 | 10 | 0 |
| 1995 | 10 | 0 |
| 1996 | 10 | 0 |
| 1997 | 9 | 0 |
| 1998 | 22 | 0 |
| 1999 | 16 | 0 |
| 2000 | 19 | 0 |
| 2001 | 25 | 7 |
| 2002 | 20 | 16 |
| 2003 | 14 | 25 |
| 2004 | 19 | 22 |
| 2005 | 15 | 10 |
| 2006 | 16 | 23 |
| 2007 | 14 | 19 |
| 2008 | 13 | 25 |
| 2009 | 14 | 34 |
| 2010 | 13 | 37 |
| 2011 | 26 | 25 |
| 2012 | 31 | 30 |
| 2013 | 18 | 41 |
| 2014 | 33 | 49 |
| 2015 | 31 | 55 |
| 2016 | 49 | 65 |
| 2017 | 47 | 57 |
| 2018 | 70 | 98 |
| 2019 | 96 | 85 |
| 2020 | 69 | 66 |
| 2021 | 49 | 88 |
| 2022 | 69 | 62 |
| 2023 | 53 | 67 |
| 2024 | 54 | 71 |
| 2025 | 67 | 56 |
| 2026 | 33 | 44 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Method for predicting thermal error of spindle of computer numerical control machine tool based on twin feature transferring of virtual-real prototype8 Sep 2026US 12,730,430 B2Zhejiang University
- Method and systems for determining compensation parameters25 Aug 2026US 12,717,302 B2Siemens Aktiengesellschaft
- Rotation mechanic equipment28 Jul 2026US 12,691,578 B2Techman Robot Inc.
- Identification of model parameters for a manufacturing machine, and use thereof for determining optimised trajectories28 Jul 2026US 12,693,649 B2Siemens Aktiengesellschaft
- Numerical control device for controlling machine tool using rotary multi-edge tool28 Jul 2026US 12,693,656 B2Fanuc Corporation
- Processing device, work machine, method of estimating backlash amount, and computer-readable storage medium storing program for estimating backlash amount8 Oct 2026US 2026/0310158 A1
- Processing device, work machine, method of estimating backlash amount, and computer-readable storage medium storing program for estimating backlash amount8 Oct 2026US 2026/0310159 A1
- Coating device and method for positioning die head thereof17 Sep 2026US 2026/0273569 A1Shenzhen Yinghe Technology Co., Ltd.
- Deep learning based prediction and correction of fabrication-process-induced structural variations in nanophotonic devices3 Sep 2026US 2026/0260329 A1National Research Council of Canada
- Abrasive articles, systems and methods of use27 Aug 2026US 2026/0249424 A13M Innovative Properties Company
Most cited
By later US patents
- System and method for real-time control of semiconductor a wafer polishing, and a polishing head316US 5,486,129 AMicron Technology, Inc. · 1996
- System for real-time control of semiconductor wafer polishing including optical monitoring282US 5,658,183 AMicron Technology, Inc. · 1997
- Notification platform architecture280US 7,243,130 B2Microsoft Corporation · 2007
- System for real-time control of semiconductor wafer polishing including optical montoring249US 5,730,642 AMicron Technology, Inc. · 1998
- Priorities generation and management245US 8,024,415 B2Microsoft Corporation · 2011