G01B 9/025
Double exposure technique
G01B9/025 (Double exposure technique) appears on 15 US grants and 1 published applications in this corpus.
Search patents in G01B- Granted patents
- 15
- Published applications
- 1
- Assignees
- 10
- Inventors
- 24
- Latest grant
- 14 Sep 2004
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1987 | 1 | 0 |
| 1988 | 1 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 1 | 0 |
| 1993 | 2 | 0 |
| 1994 | 0 | 0 |
| 1995 | 1 | 0 |
| 1996 | 1 | 0 |
| 1997 | 1 | 0 |
| 1998 | 2 | 0 |
| 1999 | 1 | 0 |
| 2000 | 3 | 0 |
| 2001 | 0 | 1 |
| 2002 | 0 | 0 |
| 2003 | 0 | 0 |
| 2004 | 1 | 0 |
By publication year. Applications have been published since 2001.
Recent patents
- Shearographic imaging machine with archive memory for animation data and air handling system14 Sep 2004US 6,791,695 B2Bandag Licensing Corporation
- Method for analyzing a separation in a deformable structure25 Jul 2000US 6,092,414 AMichelin North America, Inc.
- Method for analyzing a separation in a deformable structure18 Jul 2000US 6,089,085 AMichelin North America, Inc.
- Method for analyzing a separation in a deformable structure11 Jul 2000US 6,088,101 AMichelin North America, Inc.
- Method for analyzing a separation in a deformable structure7 Sep 1999US 5,948,976 AMichelin North America, Inc.
Most cited
By later US patents
- Method and apparatus utilizing an optical stage for topographic surface analysis38US 5,568,256 AFraunhofer-Gesellschaft zur Förderung der angewandten Forschung e. V. · 1996
- Holographic collation26US 5,216,527 A1993
- Method for analyzing a separation in a deformable structure24US 6,092,414 AMichelin North America, Inc. · 2000
- Holomoire strain analyzer20US 5,671,042 AIllinois Institute of Technology · 1997
- Optical deformation measuring apparatus by double-writing speckle images into a spatial light modulator18US 5,166,742 AHamamatsu Photonics K.K. · 1992