Sciaky, Inc.
Chicago, IL, US· latest recorded location
SCIAKY, INC. is named on 13 US grants and 13 published applications in this corpus. Its most frequent classification is B23K (Soldering or unsoldering).
- Granted patents
- 13
- Published applications
- 13
- Inventors
- 5
- Granted in 2026 so far
- 1
- Most recent grant
- 15 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 2011 | 0 | 3 |
| 2012 | 0 | 0 |
| 2013 | 3 | 0 |
| 2014 | 1 | 3 |
| 2015 | 1 | 0 |
| 2016 | 1 | 2 |
| 2017 | 0 | 0 |
| 2018 | 1 | 0 |
| 2019 | 1 | 2 |
| 2020 | 0 | 0 |
| 2021 | 1 | 1 |
| 2022 | 1 | 1 |
| 2023 | 0 | 0 |
| 2024 | 1 | 1 |
| 2025 | 1 | 0 |
| 2026 | 1 | 0 |
By publication year. 2026 runs to 8 Oct.
Technology areas
Share of 26 documents
- B23KSoldering or unsoldering26
- B33YAdditive manufacturing, i.e. manufacturing of three-dimensional [3d] objects by additive deposition, additive26
- B22FWorking metallic powder18
- Y02PLow-carbon manufacturing17
- H01JElectric discharge tubes or discharge lamps16
- C22CAlloys12
- G05BControl or regulating systems in general10
- C21DModifying the physical structure of ferrous metals4
- B29CShaping or joining of plastics3
Recent patents
- Electron beam additive manufacturing system and control components15 Sep 2026US 12,734,582 B2
- Electron beam layer manufacturing28 Jan 2025US 12,210,327 B2
- Electron beam additive manufacturing system and control components16 Jul 2024US 12,036,604 B2
- Electron beam layer manufacturing31 May 2022US 11,344,967 B2
- Raster methodology, apparatus and system for electron beam layer manufacturing using closed loop control16 Mar 2021US 10,946,474 B2
- Electron beam additive manufacturing system and control components7 Nov 2024US 2024/0367232 A1
- Electron beam layer manufacturing18 Aug 2022US 2022/0258276 A1
- Electron beam additive manufacturing system and control components30 Dec 2021US 2021/0402481 A1
- Electron beam layer manufacturing16 May 2019US 2019/0143445 A1
- Raster methodology, apparatus and system for electron beam layer manufacturing using closed loop control17 Jan 2019US 2019/0015924 A1
Most cited
By later US patents
- Electron beam layer manufacturing70US 8,546,717 B22013
- Electron beam layer manufacturing using scanning electron monitored closed loop control54US 8,809,780 B22014
- Electron beam layer manufacturing using scanning electron monitored closed loop control53US 8,598,523 B22013
- Electron beam layer manufacturing21US 9,399,264 B22016
- Electron beam layer manufacturing12US 10,189,114 B22019