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US RE48,668 E1Granted
Temperature sensing probe, burl plate, lithographic apparatus and method
AssigneeASML Netherlands B.V.
InventorsThibault Simon Mathieu Laurent, Gerardus Adrianus Antonius Maria Kusters, Johan Gertrudis Cornelis Kunnen, Sander Catharina Reinier Derks
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Abstract
A temperature sensing probe including a temperature sensor in an elongate housing wherein the elongate housing of the probe is elongate in a first direction and the elongate housing is comprised of a material which has a thermal conductivity of at least 500 W/mK at 20° C. in at least one direction.
Claims39
A burl plate for a lithographic apparatus, the burl plate comprising:
- a main body comprising an object supporting surface;
- and
- a temperature sensing probe comprising a temperature sensor in an elongate housing, wherein the elongate housing is elongate in a first direction transverse to the object supporting surface, contacts the main body along at least part of its length, and is comprised of a material with a thermal conductivity of at least 100 W/mK at 20° C. in at least one direction, wherein the at least part of the elongate housing in contact with the main body extends in lengths from opposite sides of the position of the sensor in the elongate housing.
A burl plate comprising:
- a main body comprising a substrate supporting surface;
- a heater on a surface of the main body opposite the substrate supporting surface;
- and
- a temperature sensing probe comprising a housing elongate in a direction transverse to the substrate supporting surface and/or the surface opposite the substrate supporting surface and comprising a temperature sensor, in the housing, configured to measure an average temperature averaged over a distance in the direction of a part of the main body between the substrate supporting surface and the surface opposite the substrate supporting surface.
1 more element
A lithographic apparatus comprising:
- a system to impart a pattern on a substrate;
- a burl plate comprising a main body, the main body comprising an object supporting surface;
- and
- a temperature sensing probe, comprising a temperature sensor in an elongate housing, wherein the elongate housing is elongate in a first direction transverse to the object supporting surface, contacts the main body along at least part of its length, and is comprised of a material with a thermal conductivity of at least 100 W/mK at 20° C. in at least one direction, wherein the at least part of the elongate housing in contact with the main body extends in lengths from opposite sides of the position of the sensor in the elongate housing.
1 more element
A method of compensating for a local heat load in an immersion lithographic projection apparatus, the method comprising:
- measuring an average temperature of a part of a main body of a burl plate between a substrate supporting surface of the main body and a surface opposite the substrate supporting surface, using a temperature sensing probe comprising a housing elongate in a direction transverse to the substrate supporting surface and/or the surface opposite the substrate supporting surface and comprising a temperature sensor in the housing, wherein the average temperature is averaged over a distance in the direction of the part;
- and
- controlling a heater on the surface of the main body opposite the substrate supporting surface based on a signal indicative of the average temperature.
A burl plate system for a lithographic apparatus, the burl plate system comprising:
- a main body;
- and
- a temperature sensing probe comprising a temperature sensor in a housing, wherein the housing is elongate, contacts the main body along at least part of its length, and is comprised of a material with a thermal conductivity of at least 100 W/mK at 20° C., and wherein the temperature sensor is shorter than the length of the elongate housing and wherein the at least part of the elongate housing in contact with the main body extends in lengths from opposite sides of the position of the sensor in the elongate housing.
A support structure arrangement for a lithographic apparatus, the support structure arrangement comprising:
- a main body;
- a first plurality of protrusions protruding from the main body and arranged on a first side of the main body, the ends of the first plurality of protrusions arranged to provide a support surface for a removable object and at least a portion of the main body is located underneath each of first plurality of protrusions;
- a second plurality of protrusions protruding from the main body and arranged on a second side of the main body opposite to the first side, the ends of the second plurality of protrusions arranged to provide a surface to engage with a surface of a table configured to support the main body, the second plurality of protrusions having a different pitch than the first plurality of protrusions and at least a portion of the main body is located over each of the second plurality of protrusions;
- a heat transfer channel located between the first and second surfaces, the heat transfer channel arranged to allow active transfer of heat with at least the main body;
- and
- a temperature determining arrangement.
3 more elements
A support structure arrangement for a lithographic apparatus, the support structure arrangement comprising:
- a main body;
- a first plurality of protrusions protruding from the main body and arranged on a first side of the main body, the ends of the first plurality of protrusions arranged to provide a support surface for a removable object and at least a portion of the main body is located underneath each of first plurality of protrusions;
- a second plurality of protrusions protruding from the main body and arranged on a second side of the main body opposite to the first side, the ends of the second plurality of protrusions arranged to provide a surface to engage with a surface of a table configured to support the main body, wherein, in a horizontal direction, at least one protrusion of the first plurality of protrusions is located between two adjacent protrusions of the second plurality of protrusions and at least a portion of the main body is located over each of the second plurality of protrusions;
- a heater on an external surface of the main body, the heater located at the second side;
- and
- a temperature determining device.
3 more elements
A support structure arrangement for a lithographic apparatus, the support structure arrangement comprising:
- a main body;
- a first plurality of protrusions protruding from a first surface of the main body and arranged on a first side of the main body, the ends of the first plurality of protrusions arranged to provide a support surface for a removable object and at least a portion of the main body is located underneath each of first plurality of protrusions;
- a second plurality of protrusions protruding from a second surface of the main body and arranged on a second side of the main body opposite to the first side, the ends of the second plurality of protrusions arranged to provide a surface to engage with a surface of a table configured to support the main body;
- a heat transfer channel located between the first and second surfaces, the heat transfer channel arranged to allow active transfer of heat with at least the main body, and
- a heater on an external surface of the main body, the heater located at the second side;
- and
- a temperature determining device.
4 more elements
Dependencies are inferred from the claim text.