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US 9,971,244 B2Granted
Photosensitive element, photosensitive element roll, method for producing resist pattern, and electronic component
AssigneeHitachi Chemical Company, Ltd.
InventorsNaoki Sasahara, Ikuo Mukai, Mayumi Sato, Yasuhiro Seri, Koji Abe, Manami Kiryu
Life of this patent
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Abstract
A photosensitive element 1 comprises a support film 10, a protective film (polypropylene film) 30, and a photosensitive layer 20 which is arranged between the support film 10 and the protective film 30, wherein the protective film 30 has a principal surface 30a at a side of the photosensitive layer 20 and a principal surface 30b at an opposite side of the principal surface 30a, and the principal surface 30a and the principal surface 30b are smooth.
Claims18
A photosensitive element, comprising:
- a support film;
- a polypropylene film;
- and
- a photosensitive layer arranged between the support film and the polypropylene film, wherein
- the polypropylene film has a first surface at a side of the photosensitive layer and a second surface at an opposite side to the first surface, and
- an arithmetic mean roughness Ra of the first surface and the second surface is 0.05 μm or less.
3 more elements
A photosensitive element, comprising:
- a support film;
- a polypropylene film;
- and
- a photosensitive layer arranged between the support film and the polypropylene film, wherein
- the polypropylene film has a first surface at a side of the photosensitive layer and a second surface at an opposite side to the first surface, and
- a maximum height Rmax of the first surface and the second surface is 0.5 μm or less.
3 more elements
Dependencies are inferred from the claim text.