Display driver integrated circuit and method of manufacturing the same
AssigneeSamsung Electronics Co., Ltd.
InventorsJin-Woo Park, Siwoo Kim
Life of this patent
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Abstract
A display driver integrated circuit and a method of manufacturing the same are provided. The method of manufacturing a display driver integrated circuit (DDI) including a first area, a second area, and an overlapping area in which the first area and the second area overlap each other includes forming a first pattern in the first area using a first reticle; and forming a second pattern in the second area using a second reticle, and ends of the first pattern and the second pattern are connected within the overlapping area and the first area and the second area are asymmetrically set based on the overlapping area such that the overlapping area includes only a metal line.
Claims20
A method of manufacturing a display driver integrated circuit (DDI) including a first area, a second area, and an overlapping area in which the first area and the second area overlap each other, comprising:
- forming a first pattern in the first area by performing a first photolithography using a first reticle;
- and
- forming a second pattern in the second area by performing a second photolithography separate from the first photolithography, using a second reticle,
- wherein an end of the first pattern and an end of the second pattern are connected within the overlapping area, and
- wherein a position of the first pattern in the first area and a position of the second pattern in the second area are asymmetrical to each other with respect to the overlapping area, and the overlapping area includes only a metal line.
A DDI, comprising:
- a first area formed by performing a first photolithography using a first reticle;
- and
- a second area formed by performing a second photolithography separate from the first photolithography, using a second reticle,
- wherein the first area and the second area share an overlapping area, and
- wherein the first area and the second area are asymmetrical to each other with respect to the overlapping area, and the overlapping area includes only a metal line.
A method of manufacturing a display driver integrated circuit (DDI), the method comprising:
- forming a first pattern by performing a first photolithography using a first reticle;
- and
- forming a second pattern by performing a second photolithography separate from the first photolithography using a second reticle such that an end of the first pattern and an end of the second pattern are connected in an overlapping area,
- wherein a position of the first pattern and a position of the second pattern are asymmetrical to each other with respect to the overlapping area, and the overlapping area includes only a metal line.
Dependencies are inferred from the claim text.