Coating compositions for photoresists
AssigneeRohm and Haas Electronic Materials LLC
InventorsDeyan Wang, Peter Trefonas, III, Michael K. Gallagher
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Abstract
In one aspect, the present invention relates to coating compositions that comprise a resin component, wherein the predominant portion of the resin component comprising one or more resins that are at least substantially free of fluorine. Coating compositions of the invention are useful as photoresist overcoat layers, including in immersion lithography processing.
Claims19
A coated substrate comprising:
- (a) a coating layer of a photoresist composition;
- (b) above the photoresist composition, an applied composition comprising a resin component, the predominant portion of the resin component comprising one or more resins that are at least substantially free of fluorine.
A method for processing an electronic device substrate, comprising:
- (a) applying a photoresist layer on substrate;
- (b) applying above the photoresist layer a composition comprising a resin component, the predominant portion of the resin component comprising one or more resins that are at least substantially free of fluorine.
A coating composition removable with an aqueous alkaline developer composition, the coating composition comprising:
- (i) a composition comprising a resin component, the predominant portion of the resin component comprising one or more resins that ae at least substantially free of fluorine, at least one or more of the resins comprising (a) acrylate repeat units and (b) non-acrylate repeat units;
- (ii) a fluorinated component;
- and
- (iii) an acid or acid generator compound.
Dependencies are inferred from the claim text.