Methods of preparing nanodevices
AssigneesThe Regents of the University of Colorado, a body corporate, DRS Network & Imaging Systems, LLC
InventorsVictor M. Bright, Steven George, Joseph J. Brown, Nathan T. Eigenfeld, Jason M. Gray, George Dee Skidmore
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Abstract
The present invention relates to novel nano- and micro-electromechanical devices and novel methods of preparing them. In one aspect, the invention includes methods of preparing a nanodevice. In certain embodiments, the methods comprise coating a polymer layer with a first at least one thin solid material layer using atomic layer deposition (ALD), thus forming an ALD-generated layer. In other embodiments, the methods comprise patterning the first at least one thin solid material layer to form a nanodevice. In yet other embodiments, the methods comprise releasing the nanodevice from the polymer layer.
Claims44
A method of generating a nanodevice comprising a multilevel suspended ALD structure, the method comprising:
- (a) coating at least a portion of a first solid supporting material layer with a thin solid material using atomic layer deposition (ALD), thus forming a first ALD-generated thin solid material layer;
- (b) patterning the first ALD-generated thin solid material layer;
- (c) adding an additional solid supporting material layer to the first ALD-generated thin solid material layer;
- (d) patterning the additional solid supporting material layer;
- (e) coating the additional patterned solid supporting material layer with a second thin solid material using ALD, thus forming a second ALD-generated thin solid material layer;
- (f) patterning the second ALD-generated thin solid material layer to form the nanodevice;
- and,
- (g) releasing at least a portion of the nanodevice from the solid supporting material layers, thereby generating a multilevel suspended ALD structure.
A method of generating a nanodevice, the method comprising:
- (a) coating at least a portion of a solid supporting material layer with a thin solid material layer using atomic layer deposition (ALD), thus forming an ALD-generated thin solid material layer;
- (b) patterning the thin solid material layer, thus forming a nanodevice;
- and,
- (c) releasing at least a portion of the nanodevice from the solid supporting material layer, thereby generating a suspended ALD structure.
A method of generating a nanodevice, the method comprising:
- (a) depositing an electrically conducting layer on a substrate;
- (b) patterning the electrically conducting layer;
- (c) coating the patterned electrically conducting layer with a polymer layer;
- (d) patterning the polymer layer to provide a patterned polymer layer;
- (e) depositing at least one additional layer selected from an ALD-generated layer and a non-ALD generated layer, on the patterned polymer layer thus forming a nanodevice;
- and,
- (f) releasing at least a portion of the nanodevice by removing the polymer layer, thereby generating a suspended structure.
Dependencies are inferred from the claim text.