Process chamber having separate process gas and purge gas regions

An apparatus, comprising:

• a lower dome;
• a chamber body coupled to the lower dome;
• an upper dome coupled to the chamber body;
• a substrate support disposed within the chamber body, the substrate support vertically actuatable between a loading position and a processing position;
• a process gas inlet formed in the chamber body and a process gas outlet formed in the chamber body for flowing a process gas laterally above the substrate support, wherein the process gas inlet and the process gas outlet are disposed in a first plane, and the process gas inlet and the process gas outlet are disposed above the substrate support when the substrate support is in the processing position;
• and
• a purge gas inlet formed in the chamber body and a purge gas outlet formed in the chamber body for flowing a purge gas laterally below the substrate support, wherein the purge gas inlet and the purge gas outlet are disposed in a second plane, the first plane is parallel to the second plane, and the purge gas inlet and the purge gas outlet are disposed below the substrate support when the substrate support is in the processing position.