Solid precursor delivery method using liquid solvent for thin film deposition

A method of solid precursor delivery for a vapor deposition process, comprising:

• providing a plurality of precursor ampoules, each of which comprising a first inlet for inputting a liquid precursor, a second inlet for applying a carrier gas, and an outlet for outputting a gas precursor, the liquid precursor including a ionic liquid solvent and chemical species dissolved therein;
• providing a bulk canister connected to a buffer canister and coupled to the plurality of precursor ampoules through the first inlets of the plurality of precursor ampoules, the liquid precursor retained within the bulk canister and configured to transfer to the precursor ampoules;
• generating the gas precursor at upper regions of the precursor ampoules by vaporization of the liquid precursor;
• directing the gas precursor including the chemical species through the outlets to a plurality of vapor deposition chambers by the carrier gas;
• and
• depositing the chemical species onto surfaces of substrates within the vapor deposition chambers.

A method of solid precursor delivery for a vapor deposition process, comprising:

• retaining a liquid precursor within a bulk canister, the liquid precursor including one or more ionic liquids as a solvent that dissolves chemical species of a solid precursor;
• providing the liquid precursor from the bulk canister to a precursor ampoule including an inlet coupled with a carrier gas source and an outlet coupled with a vapor deposition chamber;
• applying a carrier gas through the inlet of the precursor ampoule to create a gas precursor at an upper region of the precursor ampoule by vaporization of the liquid precursor;
• and
• carrying the gas precursor to the vapor deposition chamber by the carrier gas through the outlet of the precursor ampoule, wherein the chemical species of the solid precursor are delivered into the vapor deposition chamber and deposited onto a surface of a substrate;
• wherein the liquid precursor retained within the bulk canister is continuously provided to the precursor ampoule through a buffer canister, wherein as the liquid precursor is consumed in the precursor ampoule, the bulk canister is replaced without interrupting the vapor deposition process.