Substrate processing apparatus

A substrate processing apparatus for processing a substrate by applying processing liquid onto said substrate, comprising:

• a holding part for holding a substrate;
• a processing liquid applying part for applying pure water, which is one type of processing liquid, onto said substrate;
• and
• a cup part having a main body formed of electrical insulation material or semiconductor material, said cup part being disposed radially surrounding a plane defined by a substrate held by said holding part to receive processing liquid splashed radially from said substrate, said cup part having an inner annular surface and an outer annular surface, at least one surface of the inner annular surface and the outer annular surface of said cup part having a material thereon with a resistivity which is smaller than that of said main body.

A substrate processing apparatus for processing a substrate by applying processing liquid onto said substrate, comprising:

• a holding part for holding a substrate;
• a processing liquid applying part for applying pure water, which is one type of processing liquid, onto said substrate;
• at least one cup part being formed of electrical insulation material or semiconductor material and disposed radially surrounding a plane defined by a substrate held by said holding part to receive processing liquid splashed radially from said substrate;
• and
• a cylindrical member which is provided closely surrounding an outer annular surface of said at least one cup part, said cylindrical member having a resistivity which is smaller than that of said at least one cup part.