Etching liquid, kit of same, etching method using same, method for producing semiconductor substrate product, and method for manufacturing semiconductor element

A kit of an etching liquid which is a combination of a first liquid containing nitric acid and a second liquid containing a fluorine-containing compound and a nitrogen-containing organic compound A, which includes a plurality of repeating units containing a nitrogen atom, wherein the nitrogen-containing organic compound is a compound including a repeating unit represented by any one of the following Formulae a-2 to a-8 or a compound represented by the following Formula b,

• Ra represents a hydrogen atom, an alkyl group, an alkenyl group, an aryl group, or a heterocyclic group, Rb represents an alkyl group, an alkenyl group, or an aryl group, La represents an alkylene group, a carbonyl group, an imino group, an arylene group, a heterocyclic group, or a combination of these, Lb represents a single bond, an alkylene group, a carbonyl group, an imino group, an arylene group, a heterocyclic group, or a combination of these, Rc represents a hydrogen atom or an alkyl group, n represents an integer of 0 or greater, the upper limit of n is a number of respective substitutable cyclic structural portions, rings Q1 to Q3 represent a nitrogen-containing heterocycle, and the symbol “*” in the formula indicates a binding position,
• Rc2N-[Ld-N(Rc)]m-Ld-NRc2 b
• in the formula, Rc has the same definition as that described above, m represents an integer of 0 or greater, Ld represents an alkylene group, a carbonyl group, an imino group, an arylene group, a heterocyclic group, or a combination of these, a plurality of Rc's and Ld's may be the same as or different from each other, and a plurality of Rc's and Ld's may be bonded to each other to form a ring.

An etching liquid comprising:

• nitric acid;
• a fluorine-containing compound;
• and
• a nitrogen-containing organic compound A containing a nitrogen atom,
• wherein a content of the nitric acid is 10% by mass or more and 95% by mass or less, based on the total mass of the etching liquid,
• wherein the nitrogen-containing organic compound is a compound including a repeating unit represented by any one of the following Formulae a-1 to a-8 or a compound represented by the following Formula b,
• Ra represents a hydrogen atom, an alkyl group, an alkenyl group, an aryl group, or a heterocyclic group, Rb represents an alkyl group, an alkenyl group, or an aryl group, La represents an alkylene group, a carbonyl group, an imino group, an arylene group, a heterocyclic group, or a combination of these, Lb represents a single bond, an alkylene group, a carbonyl group, an imino group, an arylene group, a heterocyclic group, or a combination of these, Rc represents a hydrogen atom or an alkyl group, n represents an integer of 0 or greater, the upper limit of n is a number of respective substitutable cyclic structural portions, rings Q1 to Q3 represent a nitrogen-containing heterocycle, and the symbol “*” in the formula indicates a binding position,
• Rc2N-[Ld-N(Rc)]m-Ld-NRc2 b
• in the formula, Rc has the same definition as that described above, m represents an integer of 0 or greater, Ld represents an alkylene group, a carbonyl group, an imino group, an arylene group, a heterocyclic group, or a combination of these, a plurality of Rc's and Ld's may be the same as or different from each other, and a plurality of Rc's and Ld's may be bonded to each other to form a ring.

An etching liquid comprising:

• nitric acid;
• a fluorine-containing compound;
• and
• a nitrogen-containing organic compound A containing a nitrogen atom, or a phosphorus-containing compound B,
• wherein a content of the nitric acid is 10% by mass or more and 95% by mass or less, based on the total mass of the etching liquid and a concentration of the phosphorus-containing compound B in the etching liquid is 0.0001% by mass or more and 3% by mass or less,
• wherein the nitrogen-containing organic compound is a compound including a repeating unit represented by any one of the following Formulae a-1 to a-8 or a compound represented by the following Formula b,
• Ra represents a hydrogen atom, an alkyl group, an alkenyl group, an aryl group, or a heterocyclic group, Rb represents an alkyl group, an alkenyl group, or an aryl group, La represents an alkylene group, a carbonyl group, an imino group, an arylene group, a heterocyclic group, or a combination of these, Lb represents a single bond, an alkylene group, a carbonyl group, an imino group, an arylene group, a heterocyclic group, or a combination of these, Rc represents a hydrogen atom or an alkyl group, n represents an integer of 0 or greater, the upper limit of n is a number of respective substitutable cyclic structural portions, rings Q1 to Q3 represent a nitrogen-containing heterocycle, and the symbol “*” in the formula indicates a binding position,
• Rc2N-[Ld-N(Rc)]m-Ld-NRc2 b
• in the formula, Rc has the same definition as that described above, m represents an integer of 0 or greater, Ld represents an alkylene group, a carbonyl group, an imino group, an arylene group, a heterocyclic group, or a combination of these, a plurality of Rc's and Ld's may be the same as or different from each other, and a plurality of Rc's and Ld's may be bonded to each other to form a ring.