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US 9,793,145 B2Granted
Support ring with encapsulated light barrier
AssigneeApplied Materials, Inc.
InventorJoseph M. Ranish
Life of this patent
Estimating the term…
Abstract
Embodiments described herein provide a thermal processing apparatus with a heat source and a rotating substrate support opposite the heat source, the rotating substrate support comprising a support member with a light blocking member. The light blocking member may be an encapsulated component, or may be movably disposed inside the support member. The light blocking member may be opaque and/or reflective, and may be a refractory metal.
Claims14
A thermal processing apparatus, comprising:
- a heat source;
- and
- a rotatable substrate support opposite the heat source, the rotating substrate support comprising a support member with a reflective light blocking member movably disposed inside the rotating substrate support.
A thermal processing apparatus, comprising:
- a heat source;
- and
- a rotatable substrate support opposite the heat source, the rotating substrate support comprising a support member with an encapsulated, reflective, light blocking member encapsulated within an internal volume of the support member.
A thermal processing apparatus, comprising:
- a heat source;
- and
- a rotatable substrate support opposite the heat source, the rotatable substrate support comprising a support member with an encapsulated, reflective, light blocking member made of a refractory metal encapsulated in an internal volume of the support member, wherein the support member has one or more positioners protruding into the internal volume.
Dependencies are inferred from the claim text.