Semiconductor processing apparatus and method of operating the same

A semiconductor processing apparatus, comprising:

• a housing;
• a support base, disposed in the housing, comprising an upper surface, a plurality of inlets and a plurality of outlets located at the upper surface;
• a carrying arm, movably disposed on the support base, comprising a carrying plate formed with an elongated slot and configured for transporting a wafer;
• a nozzle device disposed on the carrying plate;
• and
• a wafer plate disposed on the support base configured for receiving a wafer from the carrying plate;
• wherein the carrying arm is movable toward the wafer plate, and the nozzle device is configured to emit a first gas toward the upper surface and the wafer plate,
• wherein the semiconductor processing apparatus further comprises a pin configured to protrude from the support base and extend into the elongated slot of the carrying plate when the carrying arm is moved toward the wafer plate,
• wherein the pin is movable along a protruding direction, and the elongated slot extends through the nozzle device along a direction perpendicular to the protruding direction.