Monitoring pattern for devices
AssigneeGlobalfoundries Singapore Pte. Ltd.
InventorsGuoxiang Ning, Paul Ackmann, Byoung Il Choi
Life of this patent
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Abstract
Reticle and methods for forming a device or reticle are presented. A reticle is provided with a device pattern and a first monitoring pattern. The first monitoring pattern includes a plurality of first test cells having a first test cell area and a first test pattern. The first test cells have different first pitch ratios to an anchor pitch and the first test pattern fills the first test cell area of a first test cell. A wafer with a resist layer is exposed with a lithographic system using the reticle. The resist is developed to form a patterned resist layer on the wafer and the wafer is processed using the patterned resist layer.
Claims13
A method of forming a device comprising:
- providing a reticle with a device pattern and a first monitoring pattern, wherein the first monitoring pattern includes a set of first test cells having plurality of first test cells, each of the first test cell comprises a first test cell area and a first test pattern, wherein
- the first test cell area is the same for each of the first test cell,
- the first test pattern is the same type of test pattern except that the first test patterns of different first test cells have different pitch ratios with respect to an anchor pitch, and
- the first test pattern occupies the first test cell area of each of the first test cell;
- exposing a wafer with a resist layer with a lithographic system using the reticle;
- developing the resist to form a patterned resist layer on the wafer;
- and
- processing the wafer using the patterned resist layer.
Dependencies are inferred from the claim text.