Apparatus and method for depositing multiple coating materials in a common plasma coating zone
AssigneeSabic Global Technologies B.V.
InventorSteven M. Gasworth
Life of this patent
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Abstract
An apparatus and method for coating a substrate moved along a path of travel through the apparatus. A plasma source issues a plasma jet into which a first reagent is injected from a discharge orifice located upstream of the jet. A second reagent is injected into the jet from a discharge orifice located downstream of the jet. A controller is configured to regulate the flow of the first reagent according to a first set of parameters and regulate the flow of the second reagent according to a second set of parameters. As a result, the first and second reagents are applied to the substrate to form at least one layer of a coating on the substrate.
Claims16
An apparatus for coating a substrate moved along a path of travel through the apparatus, the apparatus comprising:
- a plasma source configured to issue a plasma jet toward the substrate as the substrate is moved along the path;
- a first reagent source containing a first reagent;
- an upstream discharge orifice located upstream of the plasma source relative to the path of travel of the substrate, the first reagent source being coupled to the upstream discharge orifice, the upstream discharge orifice being located to inject, in a direction perpendicular to the direction of the plasma jet, the first reagent from the first reagent source into the plasma jet issuing from the plasma source;
- a second reagent source containing a second reagent, the second reagent being different from the first reagent;
- a downstream discharge orifice located downstream of the plasma source relative to the path of travel of the substrate, the second reagent source being coupled to the downstream discharge orifice, the downstream discharge orifice being located to inject, in a direction perpendicular to the direction of the plasma jet, the second reagent from the second reagent source into the plasma jet issuing from the plasma source;
- a third source, wherein the third source is different than the second reagent source and the first reagent source, and wherein the third source comprises an oxidizing gas;
- and
- a controller configured to regulate the flow of the first reagent to the upstream discharge orifice according to a first set of parameters so that the first reagent is only injected upstream of the plasma source, the controller being configured to regulate the flow of the second reagent to the downstream discharge orifice according to a second set of parameters so that the second reagent is only injected downstream of the plasma source, such that the first and second reagents are applied to the substrate to form a layer of a coating on the substrate.
An apparatus for coating a substrate moved along a path of travel through the apparatus, the apparatus comprising:
- a plasma source configured to issue a plasma jet toward the substrate as the substrate is moved along the path;
- a first reagent source containing a first reagent;
- an upstream discharge orifice located upstream of the plasma source relative to the path of travel of the substrate, the first reagent source being coupled to the upstream discharge orifice, the upstream discharge orifice being located to inject, in a direction perpendicular to the direction of the plasma jet, the first reagent from the first reagent source into the plasma jet issuing from the plasma source;
- a second reagent source containing a second reagent, the second reagent being different from the first reagent;
- a third source, wherein the third source is different than the second reagent source and the first reagent source, and wherein the third source comprises an oxidizing gas;
- a downstream discharge orifice located downstream of the plasma source relative to the path of travel of the substrate, the second reagent source being coupled to the downstream discharge orifice, the downstream discharge orifice being located to inject, in a direction perpendicular to the direction of the plasma jet, the second reagent from the second reagent source into the plasma jet issuing from the plasma source;
- and
- a controller configured to regulate the flow of the first reagent to the upstream discharge orifice according to a first set of parameters so that the first reagent is only injected upstream of the plasma source, the controller being configured to regulate the flow of the second reagent to the downstream discharge orifice according to a second set of parameters so that the second reagent is only injected downstream of the plasma source, such that the first and second reagents are applied to the substrate to form a layer of a coating on the substrate;
- and configured to regulate the flow of the first reagent and the second reagent to form coating layers on a substrate having different compositions.
Dependencies are inferred from the claim text.