Apparatus for measurement of a fundus comprising a focusing system and a wavefront correction device
AssigneeCanon Kabushiki Kaisha
InventorKenichi Saito
Life of this patent
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AssigneeCanon Kabushiki Kaisha
InventorKenichi Saito
Estimating the term…
An apparatus for measuring a fundus of a subject. The apparatus includes a focusing unit which adjusts a defocus of the apparatus. The focusing unit includes a first focusing mirror and a second focusing mirror. The first focusing mirror and second focusing mirror are arranged so that an incident beam from the light source entering the focusing unit and an emitted beam exiting the focusing unit are substantially parallel to each other. Adjustment of the defocus is accomplished by moving both first focusing mirror and second focusing mirror such that incident beam and emitted beam remain substantially parallel to each other. The apparatus includes a wavefront sensor for detecting a shape of a wavefront. The apparatus includes a wavefront correction device. The wavefront correction device adjusts a wavefront of the light from the light source based on the shape of the wavefront detected by the wavefront sensor.
An apparatus for measuring a fundus of a subject comprising:
An ophthalmoscope for measuring a fundus of a subject comprising:
Dependencies are inferred from the claim text.