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US 9,775,419 B2Granted
Hair treatment method
AssigneeL'oreal
InventorsGilles Genain, Gabin Vic, Stefania Nuzzo, Marie Muller
Life of this patent
Estimating the term…
Abstract
The present invention relates to a cosmetic hair treatment method comprising at least the steps consisting of: a) applying a mechanical tension to said hair, b) exposing said hair under mechanical tension to microwaves, in the presence of a solvent in vapor form in contact with said hair, without complete drying of the hair during microwave exposure, the solvent in vapor form being entirely generated by the evaporation of a compound which is present, before emission of the microwaves, in contact with the treated hair.
Claims21
A cosmetic hair treatment method comprising:
- a) applying a mechanical tension to the hair to be treated,
- b) exposing the hair under the mechanical tension to microwaves, while contacting the hair with a solvent vapour, without complete drying of the hair during the microwave exposure, to obtain the treated hair;
- wherein
- the solvent vapour is generated by evaporation of a solvent which is in contact with the hair to be treated before the exposure to the microwaves, the solvent vapour having, in the vicinity of and/or in contact with the hair, in step b), a temperature of between 100 and 150° C.;
- and
- after step b) the hair retains at least 5% of the weight of liquid compounds present before step b), in contact therewith, the liquid compound adding to natural moisture of the hair before treatment,
- and wherein a frequency of the microwaves is between 500 MHz and 10 GHz,
- the method further comprising c) applying to the treated hair at least one composition for durable shaping of the hair, the composition being a reducing composition comprising one or more reducing agents, the pH of the reducing composition being between 7 and 11, the reducing composition comprising at least one alkalifying agent, the alkalifying agent being selected from:
- aqueous ammonia,
- alkanolamines and derivatives thereof,
- ethoxylated and/or propoxylated ethylenediamines,
- alkali metal silicates,
- amino acids,
- compounds of formula (II):
- wherein
- W is a propylene residue which is optionally substituted by a hydroxyl group, or a C1-C4 alkyl radical, and
- Ra, Rb, Rc and Rd are identical or different and may be a hydrogen atom or a C1-C4 alkyl or C1-C4 hydroxyalkyl radical.
14 more elements
Dependencies are inferred from the claim text.