Sensor, lithographic apparatus and device manufacturing method

A sensor for use in an immersion lithographic apparatus, the sensor comprising:

• a surface of a member that, in use of the sensor, contacts an immersion liquid supplied to a space adjacent an element of a projection system;
• a transducer configured to convert a stimulus to an electric signal;
• and
• a temperature conditioning device,
• wherein the transducer has greater thermal coupling to the temperature conditioning device than the transducer to the surface of the member, and
• wherein a gap is provided between the temperature conditioning device and the transducer.

A device manufacturing method using a lithographic apparatus, the method comprising:

• projecting a beam patterned by a patterning device onto a substrate using a projection system while providing a liquid to a space between the projection system and the substrate;
• and
• sensing a parameter of the lithographic apparatus or of the projecting using a sensor comprising:
• a member that contacts the liquid supplied to the space;
• a transducer configured to convert a stimulus to an electric signal, and
• a temperature conditioning device,
• wherein a first heat flow path between the transducer and the temperature conditioning device has a lower thermal resistance than a second heat flow path between the transducer and the liquid, and
• wherein a gap is provided between the temperature conditioning device and the transducer.