Polymer-containing developer

A developer used in a lithography process, the developer comprising:

• a polymer for forming a dry-etching mask;
• and
• an organic solvent,
• wherein
• the developer is for forming a reverse pattern in the lithography process;
• and
• the polymer is a novolac resin, or a polyorganosiloxane obtained by hydrolysis and condensation of at least one hydrolyzable silane selected from silanes having a structure of Formula (1):
• R1aSi(R2)4−a Formula (1)
• where:
• R1 is selected from the group consisting of an alkyl group, an aryl group, an aralkyl group, a halogenated alkyl group, a halogenated aryl group, a halogenated aralkyl group, an alkenyl group, an epoxy group, an acryloyl group, a methacryloyl group, a mercapto group, an alkoxyaryl group, an acyloxyaryl group, an organic group having a cyano group, and a combination thereof;
• R1 is bonded to the silicon atom through a Si—C bond;
• R2 is selected from the group consisting of an alkoxy group, an acyloxy group, and a halogen group;
• and
• a is an integer in a range of from 0 to 3.