Scanner based optical proximity correction system and method of use

A computer program product comprising a computer usable medium having readable program code embodied in the medium, that, when executed by a computer, causes the computer program product to perform the steps of:

• modifying a simulated corrected reticle design using basic model parameters and tool parameters of a predetermined projection tool;
• creating reticle design data which represents a design of layouts to be imaged for a semiconductor device;
• comparing a prediction based on the reticle design data to exposure results of a reticle design which is based on the simulated corrected reticle design;
• creating a completed reticle design based on the comparison;
• and
• creating a mask set for use in manufacturing semiconductor devices based on the completed reticle design.

A system for deploying an application for creating a mask set, comprising:

• a computer operable to:
• modify a simulated corrected reticle design using basic model parameters and tool parameters of a predetermined projection tool;
• create reticle design data which represents a design of layouts to be imaged for a semiconductor device;
• compare a prediction based on the reticle design data to exposure results of a reticle design which is based on the simulated corrected reticle design;
• create a completed reticle design based on the comparison;
• and
• create the mask set based on the completed reticle design.

A method, comprising:

• modifying, by the computer, a simulated corrected reticle design using basic model parameters and tool parameters of a predetermined projection tool;
• creating, by the computer, reticle design data which represents a design of layouts to be imaged for a semiconductor device;
• comparing a prediction based on the reticle design data to exposure results of a reticle design which is based on the simulated corrected reticle design;
• and
• creating, by the computer, a completed reticle design based on the comparison,
• wherein the tool parameters comprise at least one of:
• illuminator details;
• lens signature as defined in terms of Jones Matrix Map representing lens signature;
• local and global flare data;
• longitudinal chromatic aberrations;
• Illuminator spectrum;
• and
• transverse and longitudinal synchronization errors.