Color filter array substrate, display device and manufacturing method of color filter array substrate

A manufacturing method of a color filter array substrate, comprising steps of:

• providing a substrate and forming a thin film transistor array on the substrate;
• forming a color filter on the thin film transistor array;
• forming a black matrix on the color filter;
• and
• forming a planarization layer on the black matrix, wherein a dielectric constant of the planarization layer is between 3.0 and 5.0 and a resistivity of the planarization layer is between 1012Ω·cm and 1014Ω·cm,
• wherein the manufacturing method of a color filter array substrate further includes a step of:
• sequentially forming a first electrode layer, a passivation layer and a second electrode layer on the planarization layer, and
• wherein after the step of forming a planarization layer on the black matrix, and before the step of sequentially forming a first electrode layer, a passivation layer and a second electrode layer on the planarization layer, the manufacturing method of a color filter array substrate further includes a step of:
• forming via holes, which directly pass through both the color filter and the planarization layer, through dry etching, so that first electrodes in the first electrode layer to be formed subsequently on the planarization layer are connected to drains of corresponding thin film transistors in the thin film transistor array through the via holes, wherein the black matrix is formed on an area of the color filter where the via holes do not pass.