A manufacturing method of an array substrate comprising a step of forming a gate line, a common electrode line, a data line, a thin film transistor (TFT) switch and a pixel electrode on a base substrate respectively, the gate line and the data line intersecting to form pixel units arranged in a matrix, each pixel unit comprising the TFT switch and the pixel electrode, wherein
- an additional electrode is further formed when forming the data line to enable the additional electrode to be located above the gate line, the additional electrode and the gate line are spaced from each other through a gate insulation layer, and the additional electrode is connected electrically with the common electrode line;
- the pixel electrode extends to over the additional electrode and is overlapped with the additional electrode, the pixel electrode is overlapped with the additional electrode and common electrode line to form a storage capacitor;
- and
- the additional electrode is not connected electrically with the pixel electrode, and the additional electrode is formed directly above the gate line, and no portions of the additional electrode are provided inside the pixel unit which is surrounded by the two directly adjacent gate lines and the two directly adjacent data lines.