Deposition method

A deposition method, comprising:

• introducing a gas into an airtight container containing electrically insulated raw material particles to generate an aerosol of the raw material particles;
• transferring the aerosol to a deposition chamber through a transfer tubing connected to the airtight container, the deposition chamber having a pressure maintained to be lower than that of the airtight container;
• injecting the aerosol from a nozzle mounted on a tip of the transfer tubing toward a target placed in the deposition chamber to cause the raw material particles to collide with the target, thereby causing the raw material particles to be positively charged;
• generating fine particles of the raw material particles by sputtering the raw material particles in a plasma generated by discharge of the charged raw material particles;
• and
• depositing the fine particles on a substrate placed in the deposition chamber, wherein the raw material particles injected from the nozzle are deflected from a first surface of the target to the substrate.