Low toxicity solvent system for polyamideimide resins and solvent system manufacture
AssigneeFujifilm Hunt Chemicals US, Inc.
InventorsJohn Sidenstick, David Noga, Kathryn Mullins, Mace Phillips
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Abstract
Disclosed is a low toxicity aprotic alkyl amide solvent system used for the manufacture and application of polyamideimide resins, and an efficient method for manufacturing the polyamideimide resins in a solvent system in a single reaction with distillation which allows recycling of intermediate streams. The solvent system can be used for either the manufacture or the dissolution of polyamideimide resins.
Claims13
A process for producing polyamideimide comprising using at least one aprotic dialkylamide solvent, wherein the at least one aprotic dialkylamide solvent includes diacetylpiperazine or N,N-diisopropylacetamide;
- wherein a ratio of the at least one aprotic dialkylamide solvent to other process co-solvents is between 19:1 and 1:1;
- and
- wherein the other process co-solvents are selected from the group consisting of water, o-xylene, triethylamine, dimethylethanolamine, morpholine, N-methylmorpholine, acetone, trimethylamine, tripropylamine, diethylamine, diisopropylamine, and caprolactam.
A process for producing polyamideimide comprising using at least one aprotic dialkylamide solvent, wherein the at least one aprotic dialkylamide solvent includes N-acetyl morpholine, diethyl acetamide, di-N-propyl acetamide, N-formyl morpholine, diacetylpiperazine, N,N-diisopropylacetamide, di-N-butylacetamide or N-propionyl morpholine;
- wherein a molar ratio of the at least one aprotic dialkylamide solvent to other process co-solvents is approximately 78:22;
- and
- wherein the other process co-solvents are selected from the group consisting of water, o-xylene, triethylamine, dimethylethanolamine, morpholine, N-methylmorpholine, acetone, trimethylamine, tripropylamine, diethylamine, diisopropylamine, and caprolactam.
Dependencies are inferred from the claim text.