Homogeneous thermal equalization with active device

A system for providing a thermal uniformity during a lithographic process, the system comprising:

• a source of lithographic energy;
• a workpiece support having a plurality of thermal devices embedded therein, wherein the workpiece support is configured to support a workpiece concurrent to an exposure of the workpiece to the lithographic energy, wherein the workpiece has a lithography film formed thereover, and wherein the plurality of thermal devices comprise one or more Peltier devices configured to cool the workpiece at a respective predetermined location associated with each of the plurality of thermal devices;
• and
• a controller, wherein the controller is configured to individually control a temperature of each of the plurality of thermal devices, therein controlling a specified temperature distribution across the workpiece associated with the exposure of the workpiece to the lithographic energy wherein the specified temperature distribution comprises a temperature of the lithographic film, and wherein the controller is configured to selectively activate one or more of the plurality of thermal devices concurrent to an exposure of the workpiece to the lithographic energy.

A method for providing a thermal uniformity during a lithographic process, the method comprising:

• positioning a workpiece on a workpiece support, wherein the workpiece has a lithography film formed thereover;
• exposing the workpiece to a source of lithographic energy;
• and
• controlling a temperature of each of a plurality of thermal devices embedded in the workpiece support concurrent with the exposure of the workpiece to the source of lithographic energy, wherein the plurality of thermal devices comprise one or more Peltier devices configured to cool the workpiece at a respective predetermined location, therein controlling a specified temperature distribution across the workpiece, wherein the specified temperature distribution comprises a temperature of the lithographic film.