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US 9,535,315 B2Granted
Method of fabricating a color filter array using a multilevel structure
AssigneeApplied Materials, Inc.
InventorsCarl P. Taussig, Edward Robert Holland, Ping Mei, Richard E. Elder
Life of this patent
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Abstract
A method of fabricating a color filter array including providing substrate, forming a multilevel structure that is attached to the substrate, etching the multilevel structure to expose first wells in the multilevel structure, filling at least the first wells in the multilevel structure with the first color component, curing the first color component, etching the multilevel structure to expose second wells in the multilevel structure, filling at least the second wells in the multilevel structure with a second color component, and curing the second color component.
Claims11
A method of fabricating a color filter array, comprising:
- providing a substrate:
- forming a multilevel structure that is attached to the substrate;
- etching the multilevel structure to expose first wells in the multilevel structure;
- filling at least the first wells in the multilevel structure with a first color component;
- curing the first color component;
- etching the multilevel structure to expose second wells in the multilevel structure;
- filling at least the second wells in the multilevel structure with a second color component;
- and
- curing the second color component, wherein the providing a substrate comprises providing a clear substrate, depositing a blocking layer on the clear substrate, etching the blocking layer in the first wells prior to the filling at least the first wells, and etching the blocking layer in the second wells prior to the filling at least the second wells, wherein the forming a multilevel structure comprises forming the multilevel structure on the blocking layer, which attaches the multilevel structure to the clear substrate, the curing the first color component comprises exposing the first color component to light through the clear substrate, and the curing the second color component comprises exposing the second color component to light through the clear substrate.
6 more elements
A method of fabricating a color filter array, comprising:
- providing a substrate:
- forming a multilevel structure that is attached to the substrate;
- etching the multilevel structure to expose first wells in the multilevel structure;
- filling at least the first wells in the multilevel structure with a first color component;
- curing the first color component;
- etching the multilevel structure to expose second wells in the multilevel structure;
- filling at least the second wells in the multilevel structure with a second color component;
- and
- curing the second color component, wherein providing a substrate comprises providing a first substrate and a release layer and forming a multilevel structure comprises forming the multilevel structure on the release layer and the method further comprises:
- transferring the multilevel structure to a second substrate.
7 more elements
A method of fabricating a color filter array, comprising:
- providing a substrate:
- forming a multilevel structure that is attached to the substrate;
- etching the multilevel structure to expose first wells in the multilevel structure;
- filling at least the first wells in the multilevel structure with a first color component;
- curing the first color component;
- etching the multilevel structure to expose second wells in the multilevel structure;
- filling at least the second wells in the multilevel structure with a second color component;
- and
- curing the second color component, wherein the providing a substrate comprises:
- providing a first conductive layer;
- applying a non-conductive layer on the first conductive layer;
- and
- applying a second conductive layer on the non-conductive layer, wherein the forming a multilevel structure comprises forming the multilevel structure on the second conductive layer and the method further comprises:
- etching the second conductive layer to fill the first wells after etching the multilevel structure to expose the first wells, wherein filling at least the first wells comprises:
- applying an electric field to the first conductive layer, and
- applying toner that is the first color component;
- and
- etching the second conductive layer to fill the second wells after etching the multilevel structure to expose the second wells, wherein the filling at least the second wells comprises:
- applying an electric field to the first conductive layer;
- and
- applying toner that is the second color component.
18 more elements
A method of fabricating a color filter array, comprising:
- providing a substrate:
- forming a multilevel structure that is attached to the substrate;
- etching the multilevel structure to expose first wells in the multilevel structure;
- filling at least the first wells in the multilevel structure with a first color component;
- curing the first color component;
- etching the multilevel structure to expose second wells in the multilevel structure;
- filling at least the second wells in the multilevel structure with a second color component;
- curing the second color component;
- and
- forming a block pattern on the substrate, wherein forming a multilevel structure comprises coating the block pattern and the substrate and the method further comprises:
- etching the block pattern after etching the multilevel structure to expose first wells;
- and
- etching the block pattern after etching the multilevel structure to expose second wells.
10 more elements
A method of fabricating a color filter array, comprising:
- imprinting a multilevel structure via roll-to-roll processing;
- etching the multilevel structure to expose wells in the multilevel structure;
- filling the wells in the multilevel structure with a color component;
- curing the color component;
- and
- depositing a blocking layer on a substrate, wherein the imprinting a multilevel structure comprises imprinting the multilevel structure on the blocking layer and the method further comprises etching the blocking layer after the etching the multilevel structure and prior to the filling the wells.
3 more elements
A method of fabricating a color filter array, comprising:
- imprinting a multilevel structure via roll-to-roll processing;
- etching the multilevel structure to expose wells in the multilevel structure;
- filling the wells in the multilevel structure with a color component;
- curing the color component;
- and
- providing a first substrate that includes a release layer, wherein the imprinting a multilevel structure comprises imprinting the multilevel structure on the release layer and the method further comprises:
- transferring the multilevel structure to a second substrate.
4 more elements
A method of fabricating a color filter array, comprising:
- imprinting a multilevel structure via roll-to-roll processing;
- etching the multilevel structure to expose wells in the multilevel structure;
- filling the wells in the multilevel structure with a color component;
- curing the color component;
- providing a first conductive layer;
- applying a non-conductive layer on the first conductive layer;
- and
- applying a second conductive layer on the non-conductive layer, wherein the imprinting a multilevel structure comprises imprinting the multilevel structure on the second conductive layer and the method further comprises:
- etching the second conductive layer to fill the wells after the etching the multilevel structure;
- and
- applying an electric field to the first conductive layer to fill the wells.
8 more elements
Dependencies are inferred from the claim text.