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AssigneeMicron Technology, Inc.
InventorsSanh D. Tang, Scott E. Sills, Whitney L. West, Rob B. Goodwin, Nishant Sinha
Estimating the term…
Methods of forming conductive elements, such as interconnects and electrodes, for semiconductor structures and memory cells. The methods include forming a first conductive material and a second conductive material comprising silver in a portion of at least one opening and performing a polishing process to fill the at least one opening with at least one of the first and second conductive materials. An annealing process may be performed to form a mixture or an alloy of the silver and the first conductive material. The methods enable formation of silver containing conductive elements having reduced dimensions (e.g., less than about 20 nm). The resulting conductive elements have a desirable resistivity. The methods may be used, for example, to form interconnects for electrically connecting active devices and to form electrodes for memory cells. A semiconductor structure and a memory cell including such a conductive structure are also disclosed.
A method of forming a semiconductor structure, comprising:
A method of forming a memory cell, comprising:
A method of forming a memory cell, comprising:
A semiconductor structure, comprising:
A memory cell, comprising:
Dependencies are inferred from the claim text.