Methods of forming a magnetic electrode of a magnetic tunnel junction and methods of forming a magnetic tunnel junction
AssigneeMicron Technology, Inc.
InventorsManzar Siddik, Witold Kula, Gurtej S. Sandhu
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AssigneeMicron Technology, Inc.
InventorsManzar Siddik, Witold Kula, Gurtej S. Sandhu
Estimating the term…
A method of forming a magnetic electrode of a magnetic tunnel junction comprises forming non-magnetic MgO-comprising material over conductive material of the magnetic electrode being formed. An amorphous metal is formed over the MgO-comprising material. Amorphous magnetic electrode material comprising Co and Fe is formed over the amorphous metal. The amorphous magnetic electrode material is devoid of B. Non-magnetic tunnel insulator material comprising MgO is formed directly against the amorphous magnetic electrode material. The tunnel insulator material is devoid of B. After forming the tunnel insulator material, the amorphous Co and Fe-comprising magnetic electrode material is annealed at a temperature of at least about 250° C. to form crystalline Co and Fe-comprising magnetic electrode material from an MgO-comprising surface of the tunnel insulator material. The crystalline Co and Fe-comprising magnetic electrode material is devoid of B. Other method and non-method embodiments are disclosed.
A method of forming a magnetic electrode of a magnetic tunnel junction, comprising:
A method of forming a magnetic electrode of a magnetic tunnel junction, comprising:
Dependencies are inferred from the claim text.