Method for producing a solar cell, in particular a silicon thin-film solar cell
AssigneeLilas GmbH
InventorVitalij Lissotschenko
Life of this patent
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Abstract
A method for producing a solar cell, in particular a silicon thin-film solar cell, wherein a TCO layer (3) is deposited on a glass substrate (1) and at least a silicon layer (4, 5) is deposited on the TCO layer (3), wherein the glass substrate (1) is exposed to electron radiation prior to the application of the TCO layer (3), thereby producing a light-scattering layer (2) of the glass substrate (1), onto which the TCO layer (3) is deposited. Alternatively or additionally, a first silicon layer (4) may be deposited on the TCO layer (3), wherein the first silicon layer (4) is exposed to laser radiation or electron radiation, and wherein a second silicon layer (5) is deposited on the irradiated first silicon layer (4).
Claims25
A method for producing a silicon thin-film solar cell, comprising the following method steps:
- depositing a TCO layer (3) on a glass substrate (1);
- depositing at least a silicon layer (4, 5) on the TCO layer (3);
- wherein prior to the application of the TCO layer (3), the glass substrate (1) is exposed to electron radiation, so that a light-scattering layer (2) of the glass substrate (1) is formed, on which the TCO layer (3) is deposited.
Dependencies are inferred from the claim text.