Thin film transistor array substrate and manufacturing method thereof

A method of manufacturing an array substrate, which includes, on a substrate, a plurality of gate lines that extend in a first direction, a plurality of data lines that extend in a second direction, and a plurality of pixel regions that are defined by the plurality of gate lines and the plurality of data lines, the method comprising:

• forming a semiconductor layer on the substrate;
• forming an insulating layer on the substrate where the semiconductor layer is formed;
• forming a gate electrode and a gate line, which is electrically connected to the gate electrode, on the insulating layer in an area that at least partially overlaps the semiconductor layer;
• forming a gate insulating layer on an entire surface of the substrate where the gate line is formed;
• forming at least one first contact hole, which at least partially exposes the semiconductor layer therethrough, by etching the gate insulating layer and the insulating layer;
• forming a data line, which includes source and drain electrodes that are connected to the semiconductor layer, on the gate insulating layer where the first contact hole is formed;
• applying a first color filter over a first pixel region on the substrate where the data line is formed and applying a second color filter over a second pixel region that is near the first pixel region;
• and
• forming a second contact hole, which partially exposes the drain electrode therethrough, by etching at least one of the first color filter and the second color filter,
• wherein the first color filter and the second color filter have an overlapped portion, which is relatively thick at the boundary between the first pixel region and the second pixel region, and an overall thickness of the overlapped portion is reduced by the forming the second contact hole includes selectively etching an upper part of the overlapped portion.

A method of manufacturing an array substrate, which includes, on a substrate, a plurality of gate lines that extend in a first direction, a plurality of data lines that extend in a second direction, and a plurality of pixel regions that are defined by the plurality of gate lines and the plurality of data lines, the method comprising:

• forming a semiconductor layer on the substrate;
• forming a first insulating layer on the substrate where the semiconductor layer is formed;
• forming a gate electrode and a gate line, which is electrically connected to the gate electrode, on the first insulating layer in an area that at least partially overlaps the semiconductor layer;
• applying a first color filter over a first pixel region on the substrate where the gate electrode and the gate line are formed and applying a second color filter over a second pixel region that is near the first pixel region;
• forming at least one first contact hole, which partially exposes the semiconductor layer therethrough, by etching at least one of the first color filter and the second color filter;
• and
• forming a data line, which includes source and drain electrodes that are connected to the semiconductor layer through the first contact hole, on at least one of the first color filter and the second color filter,
• wherein the first color filter and the second color filter have an overlapped portion, which is relatively thick at the boundary between the first pixel region and the second pixel region, and an overall thickness of the overlapped portion is reduced by the forming the first contact hole includes selectively etching an upper part of the overlapped portion.

An array substrate, comprising:

• a substrate;
• a plurality of gate lines extended in a first direction on the substrate;
• a plurality of data lines extended in a second direction on the substrate;
• a plurality of thin-film transistors (TFTs) having a source electrode and a drain electrode being electrically connected to the gate lines and the data lines;
• and
• a plurality of pixel regions defined by the gate lines and the data lines,
• wherein a first color filter is disposed in a first pixel region, a second color filter is disposed in a second pixel region near the first pixel region, and the first color filter and the second color filter have an overlapped portion at the boundary between the first pixel region and the second pixel region, and an overall thickness of the overlapped portion is reduced by having the first and second color filters that have different thicknesses from each other in the overlapped portion.