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US 9,520,363 B1Granted
Forming CMOSFET structures with different contact liners
AssigneeInternational Business Machines Corporation
InventorsKangguo Cheng, Zuoguang Liu, Tenko Yamashita
Life of this patent
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Abstract
A method of making a semiconductor device includes forming a first trench contact over a first source/drain region of a first transistor; forming a second trench contact over a second source/drain region of a second transistor; depositing a first liner material within the first trench contact; and depositing a second liner material within the second trench contact; wherein the first liner material and the second liner material include different materials.
Claims6
A semiconductor device, comprising:
- a first transistor and a second transistor, the first transistor having first source/drain regions on opposing sides of a first gate, and the second transistor having second source/drain regions on opposing sides of a second gate;
- a first trench contact arranged on a top surface of the first source/drain regions comprising a first metal liner and a sacrificial material disposed within the first trench contact, the first metal liner disposed directly on sidewalls of the first trench contact, and the sacrificial material disposed on the first metal liner to fill the first trench contact;
- a second trench contact arranged on a top surface of the second source/drain regions comprising a second metal liner disposed within the second trench contact;
- and
- a mask arranged only over the first trench contact;
- wherein the first liner and the second liner comprise different materials, and the second trench contact is open such that the second metal liner is exposed.
3 more elements
A semiconductor device, comprising:
- a first transistor and a second transistor, the first transistor having first source/drain regions on opposing sides of a first gate, and the second transistor having second source/drain regions on opposing sides of a second gate;
- a first trench contact arranged directly on a top surface of the first source/drain regions, adjacent to the first gate, and comprising a first metal liner and a sacrificial material disposed within the first trench contact, the first metal liner disposed directly on sidewalls of the first trench contact, and the sacrificial material disposed on the first metal liner to fill the first trench contact;
- a second trench contact arranged directly on a top surface of the second source/drain regions, adjacent to the second gate, and comprising a second metal liner disposed within the second trench contact;
- and
- a mask arranged only over the first trench contact;
- wherein the first liner and the second liner comprise different materials, and the second trench contact is open such that the second metal liner is exposed.
3 more elements
Dependencies are inferred from the claim text.