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US 9,520,348 B2Granted
Semiconductor devices and methods of manufacturing the same
AssigneeSamsung Electronics Co., Ltd.
InventorsByoungdeog Choi, JungWoo Seo, Sangyeon Han, Hyun-Woo Chung, Hongrae Kim, Yoosang Hwang
Life of this patent
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Abstract
A semiconductor device includes a pair of line patterns disposed on a substrate. A contact plug is disposed between the pair of line patterns and an air gap is disposed between the contact plug and the line patterns. A landing pad extends from a top end of the contact plug to cover a first part of the air gap and an insulating layer is disposed on a second part of the air gap, which is not covered by the landing pad.
Claims10
A semiconductor device, comprising:
- a pair of line patterns disposed on a substrate;
- a contact plug disposed between the pair of line patterns;
- an air gap disposed between the contact plug and the line patterns;
- a landing pad extending from a top end of the contact plug to cover a first part of the air gap;
- and
- an insulating layer disposed on a second part of the air gap, which is not covered by the landing pad;
- wherein each of the pair of line patterns comprises a conductive wire and a hard mask pattern sequentially stacked on the substrate, the hard mask pattern comprising an insulating material, and
- wherein the landing pad is contact with a top surface of the hard mask pattern of a line pattern adjacent to the first part of the air gap.
5 more elements
A semiconductor device, comprising:
- a pair of line patterns disposed on a substrate;
- a contact plug disposed between the pair of line patterns;
- an air gap disposed between the contact plug and the line patterns;
- a landing pad extending from a top end of the contact plug to cover a first part of the air gap;
- and
- an insulating layer disposed on the landing pad and a second part of the air gap, which is not covered by the landing pad;
- wherein the air gap has a closed loop-shape surrounding the contact plug in a plan view.
4 more elements
A semiconductor device, comprising:
- a pair of line patterns disposed on a substrate;
- a contact plug disposed between the pair of line patterns;
- and
- a spacer structure disposed between the contact plug and each of the line patterns,
- wherein the spacer structure comprises:
- a first protecting spacer adjacent to each of the line patterns;
- a second protecting spacer adjacent to a sidewall of the contact plug;
- and
- an air gap disposed between the first and second protecting spacers;
- wherein the second protecting spacer extends to surround the sidewall of the contact plug and has a closed loop-shape in a plan view;
- wherein the air gap extends to surround the sidewall of the contact plug and has a closed loop-shape in a plan view;
- and
- wherein the first protecting spacer has a line-shape extending along a sidewall of each of the line patterns.
10 more elements
Dependencies are inferred from the claim text.