TFT array substrate, method of manufacturing the same, and display device

A method of manufacturing a TFT array substrate, comprising:

• providing a substrate;
• forming an organic layer comprising a planarized surface layer on the substrate;
• forming a first transparent conductive layer on the organic layer;
• forming a photolithography layer on the first transparent conductive layer, wherein the photolithography layer has an opening;
• patterning the first transparent conductive layer to form a first via hole in the first transparent layer using the photolithography layer as a mask, wherein the first via hole is aligned with the opening in the photolithography layer;
• and
• patterning the organic layer to form a second via hole in the organic layer using the photolithography layer as a mask after formation of the first via hole, wherein the second via hole is aligned with the opening in the photolithography layer;
• wherein patterning the first transparent conductive layer to form the first via hole further comprises wet etching the first transparent conductive layer;
• and
• wherein patterning the organic layer to form the second via hole further comprises ashing the organic layer.