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US 9,520,265 B2Granted
Ion implantation apparatus
AssigneeSumitomo Heavy Industries Ion Technology Co., Ltd.
InventorTakanori Yagita
Life of this patent
Estimating the term…
Abstract
A multistage quadrupole lens system in an ion implantation apparatus includes a first quadrupole lens and a third quadrupole lens. A first bore radius of the first quadrupole lens may be smaller than a third bore radius of the third quadrupole lens. The multistage quadrupole lens system may further include a second quadrupole lens placed between the first quadrupole lens and the third quadrupole lens. A second bore radius of the second quadrupole lens may take a value lying between the first bore radius of the first quadrupole lens and the third bore radius of the third quadrupole lens (i.e., an intermediate value between them).
Claims15
An ion implantation apparatus comprising:
- a three-stage quadrupole lens system that is used to adjust beam focusing and defocusing, the three-stage quadrupole lens system being placed in a beam transport unit casing,
- wherein the three-stage quadrupole lens system is constructed of three quadrupole lenses, linearly arranged, having an identical central axis,
- wherein the three-stage quadrupole lens system is formed such that lens bore diameters increase in stages, and lens lengths of the three quadrupole lenses are set separately,
- wherein the three-stage quadrupole lens system is configured such that a beam transport of an ion beam along a beamline in the beam transport unit casing is achieved, the beam transport being such that a diameter of the ion beam entering the three-stage quadrupole lens system is increased in a vertical direction and/or a horizontal direction toward a downstream side of the beamline and the ion beam exits from the three-stage quadrupole lens system, and
- wherein a power supply unit of the three-stage quadrupole lens system includes:
- a separate power supply, configured to control a first quadrupole lens independently of a second quadrupole lens and a third quadrupole lens, connected between the first quadrupole lens and a reference potential of the beam transport unit casing,
- a common power supply, configured commonly for the second and third quadrupole lenses, connected between the second and third quadrupole lenses and the reference potential of the beam transport unit casing,
- wherein the ion implantation apparatus further comprises a controller configured to control the power supply unit, and comprising a plurality of beam transport setting configurations including:
- a defocusing beam transport setting configuration configured such that the ion beam exiting from the three-stage quadrupole lens system is focused in a first direction and defocused in a second direction perpendicular to the first direction, and
- a focusing beam transport setting configuration configured such that the ion beam exiting from the three-stage quadrupole lens system is focused in the first direction and focused in the second direction,
- wherein the controller is further configured to select one of the plurality of beam transport setting configurations according to a state of the ion beam, and to control the power supply unit according to the selected beam transport setting configuration, and
- wherein the defocusing beam transport setting configuration comprises a first on-off and/or voltage setting configured such that the separate power supply applies a voltage to the first quadrupole lens only, and the focusing beam transport setting comprising a second on-off and/or voltage setting configured such that the separate power supply and the common power supply apply voltages to the first, second, and third quadrupole lenses.
9 more elements
An ion implantation apparatus comprising:
- a beam focusing and defocusing multistage quadrupole lens system comprising a first quadrupole lens, a second quadrupole lens, and a third quadrupole lens arranged linearly and coaxially, and being formed such that respective lens bore diameters of the first quadrupole lens, the second quadrupole lens, and the third quadrupole lens increase in stages;
- a power supply unit;
- and
- a controller configured to control the power supply unit and comprising a plurality of beam transport setting configurations including:
- a defocusing beam transport setting configuration configured such that the ion beam exiting from the three-stage quadrupole lens system is focused in a first direction and defocused in a second direction perpendicular to the first direction, and
- a focusing beam transport setting configuration configured such that the ion beam exiting from the three-stage quadrupole lens system is focused in the first direction and focused in the second direction,
- wherein the controller is further configured to select one of the plurality of beam transport setting configurations according to a state of the ion beam, and to control the power supply unit according to the selected beam transport setting configuration, and
- wherein the defocusing beam transport setting configuration comprises a first on-off and/or voltage setting configured such that the separate power supply applies a voltage to the first quadrupole lens only, and the focusing beam transport setting comprising a second on-off and/or voltage setting configured such that the separate power supply and the common power supply apply voltages to the first, second, and third quadrupole lenses.
5 more elements
Dependencies are inferred from the claim text.