Method and apparatus for clamping and cooling a substrate for ion implantation
AssigneeVarian Semiconductor Equipment Associates, Inc.
InventorsJeffrey E. Krampert, Richard J. Hertel, John Robert Fairhurst
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AssigneeVarian Semiconductor Equipment Associates, Inc.
InventorsJeffrey E. Krampert, Richard J. Hertel, John Robert Fairhurst
Estimating the term…
A system and method are disclosed for holding and cooling substrates during processing. A substrate clamp has an engagement portion for engaging a substrate about the inside diameter as well as a portion of the substrate surface immediately adjacent to the inside diameter. The clamp has a retracted position which enables the engagement portion to fit through the substrate ID, and an expanded position which enables the engagement portion to engage the substrate ID and the substrate surface immediately adjacent to the inside diameter. The clamp can include a conformal coating to enhance engagement between the substrate and the engagement portion. The clamp can also include an energy absorbing coating on one or more surfaces to maximize the absorption of radiative energy emitted from the substrate. Other embodiments are described and claimed.
A substrate clamping assembly for holding a substrate having an inside diameter (ID) during processing, the clamping assembly comprising:
A substrate clamping assembly for holding and cooling a substrate having an inside diameter (ID) during processing, the clamping assembly comprising:
A substrate clamping assembly for holding a substrate having an inside diameter (ID) during processing, the clamping assembly comprising:
A substrate clamping assembly for holding a substrate having an inside diameter (ID) during processing, the clamping assembly comprising:
Dependencies are inferred from the claim text.