Selective synthesis of nanotubes without inhibitor
AssigneesEloret Corporation, Michael Mikio Oye
InventorMichael Mikio Oye
Life of this patent
Estimating the term…
Abstract
A method of forming nanotubes may include applying a photoresist to a metal substrate, selectively exposing a first portion of the photoresist to electromagnetic radiation while not exposing a second portion to the electromagnetic radiation, removing the second portion of the photoresist from the metal substrate exposing a first portion of the metal substrate, exposing the first portion of the metal substrate to an etchant removing the first portion of the photoresist exposing a second portion of the metal substrate, and growing carbon nanotubes on the second portion of the metal substrate.
Claims20
A method of forming nanotubes, comprising:
- applying a photoresist to a metal substrate;
- selectively exposing a first portion of the photoresist to electromagnetic radiation while not exposing a second portion to the electromagnetic radiation;
- removing the second portion of the photoresist from the metal substrate exposing a first portion of the metal substrate;
- exposing the first portion of the metal substrate to an etchant;
- removing the first portion of the photoresist exposing a second portion of the metal substrate;
- and
- growing carbon nanotubes on the second portion of the metal substrate.
A method of forming an electron source with nanotubes, comprising:
- depositing a layer of photoresist onto the surface of a metal substrate;
- applying a mask to the surface of the photoresist and selectively exposing a first portion of the photoresist to electromagnetic radiation while not exposing a second portion to the electromagnetic radiation;
- removing the second portion of the photoresist from the metal substrate exposing a first portion of the metal substrate;
- exposing the first portion of the metal substrate to an etchant;
- removing the first portion of the photoresist exposing a second portion of the metal substrate;
- and
- growing nanotubes on the second portion of the metal substrate;
- wherein growing nanotubes on the second portion of the metal substrate further comprises, before growing nanotubes on the second portion of the metal substrate:
- depositing a subsequent layer photoresist onto the surface of the metal substrate;
- applying a mask to the surface of the photoresist and selectively exposing a third portion of the photoresist to electromagnetic radiation while not exposing a fourth portion to the electromagnetic radiation;
- removing the fourth portion of the photoresist from the metal substrate exposing a third portion of the metal substrate;
- exposing the first portion of the metal substrate to the etchant;
- removing the third portion of the photoresist exposing a third portion of the metal substrate.
A system for forming nanotubes, comprising:
- a photoresist applicator to apply a photoresist to a metal substrate;
- an electromagnetic radiation source to selectively apply a first portion of the photoresist to electromagnetic radiation while not exposing a second portion to the electromagnetic radiation;
- an etchant applicator to expose a first portion of the metal substrate to an etchant, the first portion of metal substrate being exposed after removing the second portion of the photoresist from the metal substrate;
- and
- a carbon nanotube synthesizer to grow carbon nanotubes on the second portion of the metal substrate.
A method of forming nanotubes, comprising:
- applying a photoresist to a metal substrate;
- selectively exposing a first portion of the photoresist to electromagnetic radiation while not exposing a second portion to the electromagnetic radiation;
- removing the second portion of the photoresist from the metal substrate exposing a first portion of the metal substrate;
- exposing the first portion of the metal substrate to an etchant;
- removing the first portion of the photoresist exposing a second portion of the metal substrate;
- and
- growing carbon nanotubes on the second portion of the metal substrate;
- wherein a nanotube growth inhibitor is not deposited on the metal substrate.
Dependencies are inferred from the claim text.