Metrology for measurement of photosensitizer concentration within photo-sensitized chemically-amplified resist (PS-CAR)

A metrology target, comprising:

• a radiation-sensitive material layer, the radiation-sensitive material layer comprising:
• a first light wavelength activation threshold that controls the generation of acid to a first acid concentration in the radiation-sensitive material layer and controls generation of photosensitizer molecules in the radiation-sensitive material layer;
• and
• a second light wavelength activation threshold that can excite the photosensitizer molecules in the radiation-sensitive material layer that results in the acid comprising a second acid concentration that is greater than the first acid concentration, the second light wavelength being different from the first light wavelength.

A substrate, comprising:

• a plurality of die formed thereon, the die separated by a plurality of scribe lines;
• and
• at least one metrology target comprising:
• a radiation-sensitive material layer, the radiation-sensitive material layer comprising:
• a first light wavelength activation threshold that controls the generation of acid to a first acid concentration in the radiation-sensitive material layer and controls generation of photosensitizer molecules in the radiation-sensitive material layer;
• and
• a second light wavelength activation threshold that can excite the photosensitizer molecules in the radiation-sensitive material layer that results in the acid comprising a second acid concentration that is greater than the first acid concentration, the second light wavelength being different from the first light wavelength.

A method for treating a substrate, comprising:

• providing the substrate with a plurality of die formed thereon, the die separated by a plurality of scribe lines;
• and
• forming a metrology target on the substrate, the metrology target comprising:
• a radiation-sensitive material layer, the radiation-sensitive material layer comprising:
• a first light wavelength activation threshold that controls the generation of acid to a first acid concentration in the radiation-sensitive material layer and controls generation of photosensitizer molecules in the radiation-sensitive material layer;
• and
• a second light wavelength activation threshold that can excite the photosensitizer molecules in the radiation-sensitive material layer that results in the acid comprising a second acid concentration that is greater than the first acid concentration, the second light wavelength being different from the first light wavelength,
• wherein the metrology target is formed within a die or within a scribe line.