Surface position detection apparatus, exposure apparatus, and exposure method

An exposure apparatus which exposes a substrate to exposure light, the apparatus comprising:

• a holder which holds the substrate;
• and
• a position detection apparatus which detects a position of a surface of the substrate held by the holder, with respect to a direction intersecting the surface, on the basis of a light receiving result of a light beam which is guided to the surface in a diagonal direction relative to the surface and is reflected by the surface,
• the position detection apparatus comprising:
• a first reflection member which reflects the light beam, the first reflection member being arranged in an optical path of the light beam on an incidence side relative to the surface of the substrate held by the holder;
• a second reflection member which reflects the light beam from the surface, the second reflection member being arranged in the optical path of the light beam on a reflection side relative to the surface of the substrate held by the holder;
• and
• a polarizing member arranged in the optical path of the light beam between the first reflection member and the second reflection member, which changes polarization direction of each of a first polarization component and a second polarization component of the light beam from the first reflecting member, the polarization directions of which are perpendicular to each other, to the polarization direction of the respective other polarization component, wherein the polarizing member converts a P-polarized component of the light beam into an S-polarized component and an S-polarized component of the light beam into a P-polarized component.