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US 9,519,218 B2Granted
Resin, resist composition and method for producing resist pattern
AssigneeSumitomo Chemical Company, Limited
InventorsMasahiko Shimada, Takashi Nishimura, Koji Ichikawa
Life of this patent
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Abstract
1. A resist composition includes (A1) a resin which includes a structural unit represented by formula (a4), and a structural unit having a sulfonyl group, and the resin has no acid-labile group, (A2) a resin having an acid-labile group, and an acid generator. wherein R3 represents a hydrogen atom or a methyl group, and R4 represents a C1 to C24 saturated hydrocarbon group having a fluorine atom, and a methylene group contained in the saturated hydrocarbon group may be replaced by an oxygen atom or a carbonyl group.
Claims13
A resist composition comprising
- (A1) a resin which comprises a structural unit represented by formula (a4):
- wherein R3 represents a hydrogen atom or a methyl group, and
- R4 represents a C1 to C24 saturated hydrocarbon group having a fluorine atom, and a methylene group contained in the saturated hydrocarbon group may be replaced by an oxygen atom or a carbonyl group, and
- a structural unit having a sultone ring, and
- the resin having no acid-labile group,
- (A2) a resin having an acid-labile group, and
- an acid generator.
4 more elements
A resin comprising
- a structural unit represented by formula (a4):
- wherein R3 represents a hydrogen atom or a methyl group,
- R4 represents a C1 to C24 saturated hydrocarbon group having a fluorine atom and a methylene group contained in the saturated hydrocarbon group may be replaced by an oxygen atom or a carbonyl group and
- a structural unit having a sultone ring,
- the resin having no acid-labile group.
2 more elements
Dependencies are inferred from the claim text.