Positive photosensitive resin compositions

A composition, comprising:

• (a) at least one polybenzoxazole precursor polymer, the polybenzoxazole precursor polymer has Structure I, II, or II*:
• in which Ar1 is a tetravalent aromatic group, a tetravalent heterocyclic group, or mixtures thereof;
• Ar2 is a divalent aromatic or a divalent heterocyclic;
• Ar3 is a divalent aromatic group, a divalent heterocyclic group, or mixtures thereof;
• Ar4 is Ar1(OB)k3(OH)k4 or Ar2;
• x is an integer from about 4 to about 1000, y is an integer from 0 to about 500, provided that (x+y)≦1000;
• B is an acid sensitive group R1 or a moiety E-O—R2 containing an acid sensitive group R2, E is a divalent group which is not acid labile and makes an -E-OH moiety an aqueous base solubilizing group, E being selected from the group consisting of
• provided that R1, in combination with the O atom attached to the Ar1 group, is not a carbonate group;
• k3 is a fractional number between 0.1 and 2, k4 is a fractional number between 0 and 1.9 provided that (k3+k4)=2;
• G is a substituted or unsubstituted monovalent organic group having a carbonyl, carbonyloxy or sulfonyl group attached directly to the terminal NH of the polymer, and G* is a substituted or unsubstituted divalent organic group having at least one carbonyl or sulfonyl group attached directly to the terminal N of the polymer;
• (b) at least one photoacid generator;
• and
• (c) at least a first basic compound selected from the group consisting of
• tertiary amines of Structure XIV:
• in which R30, R31, and R32 are independently selected from the group consisting of a C1-C30 substituted or unsubstituted linear, branched, or cyclic alkyl, a C3-C30 tertiary aminoalkyl, a C2-C30 substituted or unsubstituted linear, branched, or cyclic hydroxyalkyl, a C6-C30 substituted or unsubstituted aryl, and a C1-C30 substituted or unsubstituted alkyl group containing at least one ether linkage, in which at least one of R30, R31, and R32 is selected from the group consisting of a C1-C30 substituted or unsubstituted cyclic alkyl, a C3-C30 tertiary aminoalkyl, a C2-C30 substituted or unsubstituted linear, branched, or cyclic hydroxyalkyl, a C6-C30 substituted or unsubstituted aryl, and a C1-C30 substituted or unsubstituted alkyl group containing at least one ether linkage, and not all of R30, R31, and R32 are a C6-C30 substituted or unsubstituted aryl;
• wherein the acid sensitive group R1 or R2 is a group capable of reacting with an acid to form an aqueous base solubilizing group and the first basic compound is from about 0.001 wt % to about 3 wt % of the composition.

A composition, comprising:

• (a) at least one polybenzoxazole precursor polymer, the polybenzoxazole precursor polymer has Structure I, II, or II*:
• in which Ar1 is a tetravalent aromatic group, a tetravalent heterocyclic group, or mixtures thereof;
• Ar2 is a divalent aromatic, a divalent heterocyclic, a divalent alicyclic, or a divalent aliphatic group that optionally contains silicon;
• Ar3 is a divalent aromatic group, a divalent aliphatic group, a divalent heterocyclic group, or mixtures thereof;
• Ar4 is Ar1(OB)k3(OH)k4 or Ar2;
• x is an integer from about 10 to about 1000, y is an integer from 0 to about 500, provided that (x+y)≦1000;
• B is an acid sensitive group R1 or a moiety E-O—R2 containing an acid sensitive group R2, E is a divalent group which is not acid labile and makes an -E-OH moiety an aqueous base solubilizing group, E being selected from the group consisting of an aromatic group, an aliphatic group, and a heterocyclic group, provided that R1, in combination with the O atom attached to the Ar1 group, is not a carbonate group;
• k3 is a fractional number between 0.1 and 2, k4 is a fractional number between 0 and 1.9 provided that (k3+k4)=2;
• G is a substituted or unsubstituted monovalent organic group having a carbonyl, carbonyloxy or sulfonyl group attached directly to the terminal NH of the polymer, and G* is a substituted or unsubstituted divalent organic group having at least one carbonyl or sulfonyl group attached directly to the terminal N of the polymer;
• (b) at least one photoacid generator;
• and
• (c) at least a first basic compound selected from the group consisting of
• tertiary amines of Structure XIV:
• in which R30, R31, and R32 are independently selected from the group consisting of a C1-C30 substituted or unsubstituted linear, branched, or cyclic alkyl, a C3-C30 tertiary aminoalkyl, a C2-C30 substituted or unsubstituted linear, branched, or cyclic hydroxyalkyl, a C6-C30 substituted or unsubstituted aryl, and a C1-C30 substituted or unsubstituted alkyl group containing at least one ether linkage, in which at least one of R30, R31, and R32 is selected from the group consisting of a C1-C30 substituted or unsubstituted cyclic alkyl, a C3-C30 tertiary aminoalkyl, a C2-C30 substituted or unsubstituted linear, branched, or cyclic hydroxyalkyl, a C6-C30 substituted or unsubstituted aryl, and a C1-C30 substituted or unsubstituted alkyl group containing at least one ether linkage, and not all of R30, R31, and R32 are a C6-C30 substituted or unsubstituted aryl;
• wherein the acid sensitive group R1 or R2 is a group capable of reacting with an acid to form an aqueous base solubilizing group and the first basic compound is from about 0.001 wt % to about 3 wt % of the composition.

A composition, comprising:

• (a) at least one polybenzoxazole precursor polymer, the polybenzoxazole precursor polymer has Structure I, II, or II*:
• in which Ar1 is a tetravalent aromatic group, a tetravalent heterocyclic group, or mixtures thereof;
• Ar2 is a divalent aromatic, or a divalent heterocyclic, a divalent alicyclic, or a divalent aliphatic group that optionally contains silicon;
• Ar3 is a divalent aromatic group, a divalent aliphatic group, a divalent heterocyclic group, or mixtures thereof;
• Ar4 is Ar1(OB)k3(OH)k4 or Ar2;
• x is an integer from about 10 to about 1000, y is an integer from 0 to about 500, provided that (x+y)≦1000;
• B is an acid sensitive group R1 or a moiety E-O—R2 containing an acid sensitive group R2, E is a divalent group which is not acid labile and makes an -E-OH moiety an aqueous base solubilizing group, E being selected from the group consisting of
• provided that R1, in combination with the O atom attached to the Ar1 group, is not a carbonate group;
• k3 is a fractional number between 0.1 and 2, k4 is a fractional number between 0 and 1.9 provided that (k3+k4)=2;
• G is a substituted or unsubstituted monovalent organic group having a carbonyl, carbonyloxy or sulfonyl group attached directly to the terminal NH of the polymer, and G* is a substituted or unsubstituted divalent organic group having at least one carbonyl or sulfonyl group attached directly to the terminal N of the polymer;
• (b) at least one photoacid generator;
• and
• (c) at least a first basic compound selected from the group consisting of
• tertiary amines of Structure XIV:
• in which R30, R31, and R32 are independently selected from the group consisting of a C1-C30 substituted or unsubstituted linear, branched, or cyclic alkyl, a C3-C30 tertiary aminoalkyl, a C2-C30 substituted or unsubstituted linear, branched, or cyclic hydroxyalkyl, a C6-C30 substituted or unsubstituted aryl, and a C1-C30 substituted or unsubstituted alkyl group containing at least one ether linkage, in which at least one of R30, R31, and R32 is selected from the group consisting of a C1-C30 substituted or unsubstituted cyclic alkyl, a C3-C30 tertiary aminoalkyl, a C2-C30 substituted or unsubstituted linear, branched, or cyclic hydroxyalkyl, a C6-C30 substituted or unsubstituted aryl, and a C1-C30 substituted or unsubstituted alkyl group containing at least one ether linkage, and not all of R30, R31, and R32 are a C6-C30 substituted or unsubstituted aryl;
• wherein the acid sensitive group R1 or R2 is a group capable of reacting with an acid to form an aqueous base solubilizing group and the first basic compound is from about 0.001 wt % to about 3 wt % of the composition.